High quality low-temperature GaAs film grown by conventional metalorganic chemical vapor deposition

Mapping Intimacies ◽

10.1109/edms.1994.771209 ◽

2005 ◽

Author(s):

Wei-Kuo Chen

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Gaas Film ◽

High Quality ◽

Low Temperature Gaas ◽

Metalorganic Chemical

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High quality low-temperature GaAs film grown by conventional metalorganic chemical vapor deposition

10.1109/edms.1994.863788 ◽

2005 ◽

Author(s):

Wei-Kuo Chen

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Gaas Film ◽

High Quality ◽

Low Temperature Gaas ◽

Metalorganic Chemical

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Structure of high resistivity GaAs film grown by low‐temperature metalorganic chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.118022 ◽

1996 ◽

Vol 69 (21) ◽

pp. 3239-3241

Author(s):

Wen‐Chung Chen ◽

C.‐S. Chang ◽

S. H. Chan

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

High Resistivity ◽

Gaas Film ◽

Metalorganic Chemical

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Low-Temperature GaAs Metalorganic Chemical Vapor Deposition Using Dimethylamine Gallane and Arsine

Japanese Journal of Applied Physics ◽

10.1143/jjap.32.l160 ◽

1993 ◽

Vol 32 (Part 2, No. 2A) ◽

pp. L160-L163 ◽

Author(s):

Yoshiharu Yamauchi ◽

Naoki Kobayashi

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Low Temperature Gaas ◽

Metalorganic Chemical

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High quality undopedn‐type GaSb epilayers by low‐temperature metalorganic chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.354643 ◽

1993 ◽

Vol 74 (4) ◽

pp. 2892-2895 ◽

Author(s):

S. M. Chen ◽

Y. K. Su

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

High Quality ◽

Metalorganic Chemical

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Properties of Highly Resistive and Nonstoichiometric GaAs Film Grown by Low-temperature Metalorganic Chemical Vapor Deposition Using Tertiarybutylarsine

Japanese Journal of Applied Physics ◽

10.1143/jjap.36.3649 ◽

1997 ◽

Vol 36 (Part 1, No. 6A) ◽

pp. 3649-3654 ◽

Author(s):

Wen-Chung Chen ◽

C.-S. Chang ◽

Wei-Kuo Chen

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Gaas Film ◽

Metalorganic Chemical

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High‐quality YBa2Cu3O7−xthin films by plasma‐enhanced metalorganic chemical vapor deposition at low temperature

Applied Physics Letters ◽

10.1063/1.105468 ◽

1991 ◽

Vol 59 (10) ◽

pp. 1254-1256 ◽

Author(s):

J. Zhao ◽

Y. Q. Li ◽

C. S. Chern ◽

P. Lu ◽

P. Norris ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

High Quality ◽

Metalorganic Chemical

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Structural and electrical properties of BaTiO3thin films grown onp‐InSb substrate by metalorganic chemical vapor deposition at low temperature

Applied Physics Letters ◽

10.1063/1.109550 ◽

1993 ◽

Vol 62 (15) ◽

pp. 1788-1790 ◽

Author(s):

T. W. Kim ◽

M. Jung ◽

H. J. Kim ◽

Y. S. Yoon ◽

W. N. Kang ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Electrical Properties ◽

Low Temperature ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Structural And Electrical Properties ◽

Metalorganic Chemical

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High speed metal‐semiconductor‐metal photodetector manufactured on GaAs by low‐temperature photoassisted metalorganic chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.114129 ◽

1995 ◽

Vol 66 (26) ◽

pp. 3651-3653 ◽

Author(s):

K. S. Boutros ◽

J. C. Roberts ◽

S. M. Bedair ◽

T. F. Carruthers ◽

M. Y. Frankel

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Metal Semiconductor Metal ◽

Metalorganic Chemical

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High‐quality GaInAsP/InP heterostructures grown by low‐pressure metalorganic chemical vapor deposition on silicon substrates

Applied Physics Letters ◽

10.1063/1.99521 ◽

1988 ◽

Vol 52 (3) ◽

pp. 209-211 ◽

Author(s):

M. Razeghi ◽

F. Omnes ◽

M. Defour ◽

Ph. Maurel

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Silicon Substrates ◽

High Quality ◽

Metalorganic Chemical

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Low Temperature Fabrication Of YBa2Cu3O7−x High-Tc Superconducting Thin Films By Plasma-Enhanced Metalorganic Chemical Vapor Deposition

Science and Technology of Thin Film Superconductors 2 ◽

10.1007/978-1-4684-1345-8_32 ◽

1990 ◽

pp. 217-222

Author(s):

J. Zhao ◽

D. W. Noh ◽

C. S. Chern ◽

Y. Q. Li ◽

P. Norris ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Superconducting Thin Films ◽

High Tc ◽

Metalorganic Chemical

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