Nitrogenated amorphous carbon films prepared by unbalanced magnetron sputtering for high recording density media

INTERMAG Asia 2005. Digests of the IEEE International Magnetics Conference, 2005. ◽

10.1109/intmag.2005.1464126 ◽

2005 ◽

Author(s):

J.R. Shi ◽

S.N. Piramanayagam

Keyword(s):

Magnetron Sputtering ◽

Amorphous Carbon ◽

Carbon Films ◽

Amorphous Carbon Films ◽

Recording Density ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron

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Study on nitrogenated amorphous carbon films prepared by unbalanced magnetron sputtering

Journal of Applied Physics ◽

10.1063/1.2168027 ◽

2006 ◽

Vol 99 (3) ◽

pp. 033505 ◽

Author(s):

J. R. Shi

Keyword(s):

Magnetron Sputtering ◽

Amorphous Carbon ◽

Carbon Films ◽

Amorphous Carbon Films ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron

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Mechanisms of growth, properties and degradation of amorphous carbon films by closed field unbalanced magnetron sputtering on stainless steel bipolar plates for PEMFCs

Applied Surface Science ◽

10.1016/j.apsusc.2017.06.122 ◽

2017 ◽

Vol 422 ◽

pp. 921-931 ◽

Author(s):

Feifei Bi ◽

Kun Hou ◽

Peiyun Yi ◽

Linfa Peng ◽

Xinmin Lai

Keyword(s):

Stainless Steel ◽

Magnetron Sputtering ◽

Amorphous Carbon ◽

Carbon Films ◽

Closed Field ◽

Bipolar Plates ◽

Amorphous Carbon Films ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron ◽

Growth Properties

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Synthesis and mechanical properties of amorphous carbon films by closed-field unbalanced magnetron sputtering

Materials Letters ◽

10.1016/j.matlet.2003.10.021 ◽

2004 ◽

Vol 58 (9) ◽

pp. 1513-1516 ◽

Author(s):

H Myung

Keyword(s):

Mechanical Properties ◽

Magnetron Sputtering ◽

Amorphous Carbon ◽

Carbon Films ◽

Closed Field ◽

Amorphous Carbon Films ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron

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The electrical and structural properties of the hydrogenated amorphous carbon films grown by close field unbalanced magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2004.11.160 ◽

2005 ◽

Vol 482 (1-2) ◽

pp. 275-279 ◽

Author(s):

Yong Seob Park ◽

Hyun Sik Myung ◽

Jeon Geon Han ◽

Byungyou Hong

Keyword(s):

Magnetron Sputtering ◽

Structural Properties ◽

Amorphous Carbon ◽

Carbon Films ◽

Amorphous Carbon Films ◽

Hydrogenated Amorphous Carbon ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron ◽

Hydrogenated Amorphous

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The effect of duty cycle on the microstructure and properties of graphite-like amorphous carbon films prepared by unbalanced magnetron sputtering

Journal of Physics D Applied Physics ◽

10.1088/0022-3727/43/50/505401 ◽

2010 ◽

Vol 43 (50) ◽

pp. 505401 ◽

Author(s):

Yongjun Wang ◽

Hongxuan Li ◽

Li Ji ◽

Fei Zhao ◽

Xiaohong Liu ◽

...

Keyword(s):

Magnetron Sputtering ◽

Amorphous Carbon ◽

Carbon Films ◽

Amorphous Carbon Films ◽

Microstructure And Properties ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron

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Characteristics of sputtered amorphous carbon films prepared by a closed-field unbalanced magnetron sputtering method

Journal of Non-Crystalline Solids ◽

10.1016/j.jnoncrysol.2008.08.007 ◽

2008 ◽

Vol 354 (52-54) ◽

pp. 5504-5508 ◽

Author(s):

Yong Seob Park ◽

Byungyou Hong

Keyword(s):

Magnetron Sputtering ◽

Amorphous Carbon ◽

Carbon Films ◽

Closed Field ◽

Amorphous Carbon Films ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron

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Studies on the influence of sputtering power on amorphous carbon films deposited by pulsed unbalanced magnetron sputtering

Optik ◽

10.1016/j.ijleo.2015.11.154 ◽

2016 ◽

Vol 127 (5) ◽

pp. 2512-2515 ◽

Author(s):

H.Y. Dai ◽

C. Zhan ◽

J. Du

Keyword(s):

Magnetron Sputtering ◽

Amorphous Carbon ◽

Carbon Films ◽

Amorphous Carbon Films ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron ◽

Sputtering Power

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Effect of substrate bias voltage and substrate on the structural properties of amorphous carbon films deposited by unbalanced magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2004.11.158 ◽

2005 ◽

Vol 482 (1-2) ◽

pp. 45-49 ◽

Author(s):

I. Ahmad ◽

S.S. Roy ◽

P.D. Maguire ◽

P. Papakonstantinou ◽

J.A. McLaughlin

Keyword(s):

Magnetron Sputtering ◽

Structural Properties ◽

Bias Voltage ◽

Amorphous Carbon ◽

Carbon Films ◽

Substrate Bias ◽

Substrate Bias Voltage ◽

Amorphous Carbon Films ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron

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Microstructure, mechanical and tribological properties of graphite-like amorphous carbon films prepared by unbalanced magnetron sputtering

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2010.11.019 ◽

2011 ◽

Vol 205 (8-9) ◽

pp. 3058-3065 ◽

Author(s):

Yongjun Wang ◽

Hongxuan Li ◽

Li Ji ◽

Fei Zhao ◽

Qinghua Kong ◽

...

Keyword(s):

Magnetron Sputtering ◽

Amorphous Carbon ◽

Tribological Properties ◽

Carbon Films ◽

Amorphous Carbon Films ◽

Mechanical And Tribological Properties ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron

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Analysis of hydrogenated amorphous carbon films deposited by middle frequency pulsed unbalanced magnetron sputtering

Journal of Non-Crystalline Solids ◽

10.1016/j.jnoncrysol.2012.12.012 ◽

2013 ◽

Vol 363 ◽

pp. 77-83 ◽

Author(s):

Haiyang Dai ◽

Jing Chen ◽

Renzhong Xue ◽

Tao Li ◽

Zhenping Chen

Keyword(s):

Magnetron Sputtering ◽

Amorphous Carbon ◽

Carbon Films ◽

Amorphous Carbon Films ◽

Hydrogenated Amorphous Carbon ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron ◽

Hydrogenated Amorphous

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