Nanocrystalline-si thin film fabricated by inductively coupled plasma chemical vapor deposition for flexible electronics

2005 International Semiconductor Device Research Symposium ◽

10.1109/isdrs.2005.1596175 ◽

2006 ◽

Author(s):

Sang-Myeon Han ◽

Joong-Hyun Park ◽

Hye-Jin Lee ◽

Kwang-Sub Shin ◽

Min-Koo Han

Keyword(s):

Thin Film ◽

Flexible Electronics ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled ◽

Si Thin Film ◽

Nanocrystalline Si

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Hydrogenation of nanocrystalline Si thin film transistors employing inductively coupled plasma chemical vapor deposition for flexible electronics

Thin Solid Films ◽

10.1016/j.tsf.2006.11.147 ◽

2007 ◽

Vol 515 (19) ◽

pp. 7442-7445 ◽

Author(s):

Sang-Myeon Han ◽

Joong-Hyun Park ◽

Sang-Geun Park ◽

Sun-Jae Kim ◽

Min-Koo Han

Keyword(s):

Flexible Electronics ◽

Vapor Deposition ◽

Thin Film Transistors ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled ◽

Si Thin Film ◽

Nanocrystalline Si

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Coplanar amorphous silicon thin film transistor fabricated by inductively coupled plasma chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.368581 ◽

1998 ◽

Vol 84 (7) ◽

pp. 4006-4012 ◽

Author(s):

Sung Ki Kim ◽

Young Jin Choi ◽

Kyu Sik Cho ◽

Jin Jang

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Thin Film Transistor ◽

Chemical Vapor ◽

Plasma Chemical ◽

Silicon Thin Film ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled

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High quality nanocrystalline silicon thin film fabricated by inductively coupled plasma chemical vapor deposition at 350°C

Journal of Non-Crystalline Solids ◽

10.1016/j.jnoncrysol.2007.09.082 ◽

2008 ◽

Vol 354 (19-25) ◽

pp. 2268-2271 ◽

Author(s):

Sang-Myeon Han ◽

Sun-Jae Kim ◽

Joong-Hyun Park ◽

Sung-Hwan Choi ◽

Min-Koo Han

Keyword(s):

Thin Film ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Plasma Chemical ◽

Silicon Thin Film ◽

High Quality ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled

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Inductively Coupled Plasma Chemical Vapor Deposition System for Thin Film Ppassivation of Top Emitting Organic Light Emitting Diodes

Journal of the Korean Institute of Electrical and Electronic Material Engineers ◽

10.4313/jkem.2006.19.6.538 ◽

2006 ◽

Vol 19 (6) ◽

pp. 538-546

Author(s):

Han-Ki Kim

Keyword(s):

Thin Film ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Organic Light Emitting Diodes ◽

Plasma Chemical ◽

Light Emitting ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled ◽

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Thin film passivation of organic light emitting diodes by inductively coupled plasma chemical vapor deposition

Thin Solid Films ◽

10.1016/j.tsf.2006.11.030 ◽

2007 ◽

Vol 515 (11) ◽

pp. 4758-4762 ◽

Author(s):

Han-Ki Kim ◽

Sang-Woo Kim ◽

Do-Geun Kim ◽

Jae-Wook Kang ◽

Myung Soo Kim ◽

...

Keyword(s):

Thin Film ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Organic Light Emitting Diodes ◽

Plasma Chemical ◽

Light Emitting ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled ◽

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High voltage AlGaN/GaN Schottky barrier diode employing the inductively coupled plasma-chemical vapor deposition SiO2 passivation

2007 7th Internatonal Conference on Power Electronics ◽

10.1109/icpe.2007.4692351 ◽

2007 ◽

Author(s):

Young-Hwan Choi ◽

Jiyong Lim ◽

Kyu-Heon Cho ◽

Min-Koo Han

Keyword(s):

Chemical Vapor Deposition ◽

Schottky Barrier ◽

High Voltage ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Schottky Barrier Diode ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled

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Cubic boron nitride thin film synthesis on silica substrates by low-pressure inductively-coupled r.f. plasma chemical vapor deposition

Thin Solid Films ◽

10.1016/s0040-6090(99)00540-4 ◽

1999 ◽

Vol 354 (1-2) ◽

pp. 24-28 ◽

Author(s):

K.K. Chattopadhyay ◽

S. Matsumoto ◽

Y.-F. Zhang ◽

I. Sakaguchi ◽

M. Nishitani-Gamo ◽

...

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Boron Nitride ◽

Vapor Deposition ◽

Cubic Boron Nitride ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled ◽

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Low Temperature Silicon Nitride and Silicon Dioxide Film Processing by Inductively Coupled Plasma Chemical Vapor Deposition

Journal of The Electrochemical Society ◽

10.1149/1.1393382 ◽

2000 ◽

Vol 147 (4) ◽

pp. 1481 ◽

Author(s):

J. W. Lee ◽

K. D. Mackenzie ◽

D. Johnson ◽

J. N. Sasserath ◽

S. J. Pearton ◽

...

Keyword(s):

Silicon Nitride ◽

Silicon Dioxide ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Silicon Dioxide Film ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled ◽

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Electron Field Emission from a-C:F:N Film Deposited by Inductively Coupled Plasma Chemical Vapor Deposition

SID Symposium Digest of Technical Papers ◽

10.1889/1.1833829 ◽

1998 ◽

Vol 29 (1) ◽

pp. 601

Author(s):

Suk Jae Chung ◽

Eun Jung Han ◽

Jong Hyun Moon ◽

Myung Hwan Oh ◽

Jin Jang

Keyword(s):

Chemical Vapor Deposition ◽

Field Emission ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Electron Field Emission ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled ◽

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Organo-Functionalization of Silicon Nanocrystals Synthesized by Inductively Coupled Plasma Chemical Vapor Deposition

Bulletin of the Korean Chemical Society ◽

10.1002/bkcs.10758 ◽

2016 ◽

Vol 37 (5) ◽

pp. 705-712

Author(s):

Don-Sung Lee ◽

Dong-Hoe Choe ◽

Seung-Wan Yoo ◽

Jung-Hyung Kim ◽

Hyun-Dam Jeong

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Silicon Nanocrystals ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled

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