Quaternary AlInGaN photodetectors with MIS structure

Author(s):  
H. Hung ◽  
S.J. Chang ◽  
S.J. Young ◽  
Y.C. Lin ◽  
S.M. Wang ◽  
...  
Keyword(s):  
1988 ◽  
Vol 13 (4) ◽  
pp. 315-321 ◽  
Author(s):  
Kenji Murakami ◽  
Dong-Bai Ye ◽  
Tatsuo Yamamoto
Keyword(s):  

1985 ◽  
Vol 18 (7) ◽  
pp. 577-586 ◽  
Author(s):  
L W Westcott ◽  
G Rogers
Keyword(s):  

2000 ◽  
Vol 62 (3) ◽  
pp. 273-276 ◽  
Author(s):  
Z Benamara ◽  
S Tizi ◽  
M Chellali ◽  
B Gruzza

2000 ◽  
Vol 622 ◽  
Author(s):  
Flaminia Serina ◽  
C. Huang ◽  
G. W. Auner ◽  
R. Naik ◽  
S. Ng ◽  
...  

ABSTRACTAn AlN (insulator) MIS Hydrogen Sensor was created using plasma source molecular beam epitaxy (PSMBE) deposition on Si (111) and 6H-SiC. A Pd layer was deposited on top of the AlN film via magnetron sputtering technique utilizing a hard mask. Pd was chosen since H2 readily diffuses within its bulk, thus Pd acts not only as a metal electrode of the MIS structure, but also as a catalyst for hydrogen dissociation. To optimize the design structure several sensors with different AlN and Pd thickness have been developed. RHEED and XRD measurements show that AlN film is epitaxial on both Si (111) and 6H-SiC substrates. The sensors were characterized using capacitance versus voltage C(V) and I(V) measurements, at different frequencies ranging from 1kHz to 1 MHz. Shifts in the C-V and I-V curves occurred with the introduction of hydrogen in the chamber. The temperature, hydrogen partial pressure, effects of oxygen and hydrocarbon gases, insulator and metal thicknesses on sensor response were analyzed.


1987 ◽  
Vol 70 (1) ◽  
pp. 40-48
Author(s):  
Yusuke Mizokawa ◽  
Osamu Komoda ◽  
Tatsuro Miyasato ◽  
Shigehiko Hasegawa ◽  
Masao Tokumura ◽  
...  

2011 ◽  
Vol 110 (4) ◽  
pp. 044323 ◽  
Author(s):  
M. I. Vexler
Keyword(s):  

2011 ◽  
Vol 22 (45) ◽  
pp. 455702 ◽  
Author(s):  
Xing Wu ◽  
Kin-Leong Pey ◽  
Nagarajan Raghavan ◽  
Wen-Hu Liu ◽  
Xiang Li ◽  
...  

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