Monte Carlo simulation of high-energy electron beam lithography process

Author(s):  
Jiang-Yong Pan ◽  
Zai-Fa Zhou ◽  
Qi Gan ◽  
Wen-Qin Xu
Author(s):  
Erik H. Anderson ◽  
Deirdre L. Olynick ◽  
Weilun Chao ◽  
Bruce Harteneck ◽  
Eugene Veklerov

Langmuir ◽  
2008 ◽  
Vol 24 (5) ◽  
pp. 2057-2063 ◽  
Author(s):  
Nikolaj Gadegaard ◽  
Xinyong Chen ◽  
Frank J. M. Rutten ◽  
Morgan R. Alexander

Sign in / Sign up

Export Citation Format

Share Document