Methods for Measuring Microwave Properties of Ferroelectric Films

Microwave Measurements of Ferroelectric Thin Films: Techniques, Error and Limitations

MRS Proceedings ◽

10.1557/proc-784-c5.5 ◽

2003 ◽

Vol 784 ◽

Author(s):

Peter Kr. Petrov

Keyword(s):

Thin Films ◽

Sensitivity Analysis ◽

Dielectric Loss ◽

Measurement Data ◽

Ferroelectric Thin Films ◽

Microwave Properties ◽

Microwave Measurements ◽

Ferroelectric Films

ABSTRACTThis paper examines the problem of evaluating the microwave properties of thin ferroelectric films patterned as planar capacitors. Two types of microwave measurements of ferroelectric thin films are considered: reflection and resonance type measurements. Algorithms are presented for evaluation of capacitance-permittivity and dielectric loss. Using sensitivity analysis, the error and limitations associated with these measurements are estimated. The end result is a series of formulae that use the network analyser's measurement data to calculate the capacitance-permittivity, the dielectric loss, and the associated error.

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Epitaxial ferroelectric thin films

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100170591 ◽

1994 ◽

Vol 52 ◽

pp. 572-573

Author(s):

S. G. Ghonge ◽

E. Goo ◽

R. Ramesh ◽

R. Haakenaasen ◽

D. K. Fork

Keyword(s):

Single Crystal ◽

Work Function ◽

Nonvolatile Memory ◽

Ferroelectric Properties ◽

Electrical Contact ◽

Memory Devices ◽

Ferroelectric Films ◽

Si Substrates ◽

Electro Optic ◽

Wide Range

Microstructure of epitaxial ferroelectric/conductive oxide heterostructures on LaAIO3(LAO) and Si substrates have been studied by conventional and high resolution transmission electron microscopy. The epitaxial films have a wide range of potential applications in areas such as non-volatile memory devices, electro-optic devices and pyroelectric detectors. For applications such as electro-optic devices the films must be single crystal and for applications such as nonvolatile memory devices and pyroelectric devices single crystal films will enhance the performance of the devices. The ferroelectric films studied are Pb(Zr0.2Ti0.8)O3(PLZT), PbTiO3(PT), BiTiO3(BT) and Pb0.9La0.1(Zr0.2Ti0.8)0.975O3(PLZT).Electrical contact to ferroelectric films is commonly made with metals such as Pt. Metals generally have a large difference in work function compared to the work function of the ferroelectric oxides. This results in a Schottky barrier at the interface and the interfacial space charge is believed to responsible for domain pinning and degradation in the ferroelectric properties resulting in phenomenon such as fatigue.

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