A simple method for determining the uniaxial anisotropy direction and skew in magnetic thin films

1971 ◽  
Vol 7 (4) ◽  
pp. 910-911 ◽  
Author(s):  
E. Hsieh ◽  
L. Schwee
Keyword(s):  
Thin Films ◽  
Uniaxial Anisotropy ◽  
Magnetic Thin Films ◽  
Simple Method ◽  
Anisotropy Direction

Magnetization Reversal by Rotation in Magnetic Thin Films Deposited on Step Bunched Si(111) Substrates

1997 ◽  
Vol 475 ◽  
Author(s):  
M. Sussiau ◽  
A. Encinas ◽  
F. Nguyen Van Dau ◽  
A. Vaurès ◽  
A. Schuhl ◽  
...  
Keyword(s):  
Thin Films ◽  
Heat Treatment ◽  
Magnetization Reversal ◽  
Molecular Beam ◽  
Uniaxial Anisotropy ◽  
Magnetic Thin Films ◽  
Induced Anisotropy ◽  
Reversal Process ◽  
Magnetic Metal ◽  
Magnetization Reversal Process

ABSTRACTMagnetic and magnetoresistive properties of magnetic thin films deposited on periodically structured substrates have been studied. By using a thermodynamical heat treatment, we activate the step bunching phenomenon on vicinal Si(111) substrates misoriented towards [112] which results in a laterally modulated surface with a period around 0.1 μm. Epitaxial magnetic thin films deposited on these substrates exhibit an in-plane uniaxial anisotropy and a specific magnetoresistive behavior which characterizes the magnetization reversal process. In this contribution, we demonstrate that these properties can also be observed in non-epitaxial structures grown either by molecular beam epitaxy or by sputtering. In particular, magnetotransport measurements show that by varying parameters such as the nature of the magnetic metal, the layer thickness or the strength of the induced anisotropy, we can modulate the interplay between the anisotropy and the exchange stiffness, and, consequently, observe gradual magnetization reversal behaviors between a Stoner-Wohlfarth uniform mode and a non-uniform mode.

scholarly journals Fabrication of flexible oriented magnetic thin films with large in-plane uniaxial anisotropy by roll-to-roll nanoimprint lithography

2016 ◽  
Vol 407 ◽  
pp. 273-278 ◽  
Author(s):  
Rukshan M. Thantirige ◽  
Jacob John ◽  
Nihar R. Pradhan ◽  
Kenneth R. Carter ◽  
Mark T. Tuominen
Keyword(s):  
Thin Films ◽  
Nanoimprint Lithography ◽  
Uniaxial Anisotropy ◽  
Magnetic Thin Films ◽  
Roll To Roll

Study of induced uniaxial anisotropy in magnetic thin films by transverse susceptibility

1987 ◽  
Vol 62 (8) ◽  
pp. 3328-3330 ◽  
Author(s):  
K. Le Dang ◽  
P. Veillet ◽  
G. Suran ◽  
K. Ounadjela
Keyword(s):  
Thin Films ◽  
Uniaxial Anisotropy ◽  
Magnetic Thin Films

Transmission Electron Microscopy studies of texture of Cr underlayer of magnetic recording hard disk

1991 ◽  
Vol 49 ◽  
pp. 580-581
Author(s):  
L. Tang ◽  
G. Thomas ◽  
M. R. Khan ◽  
S. L. Duan
Keyword(s):  
Electron Microscopy ◽  
Thin Films ◽  
Transmission Electron Microscopy ◽  
Magnetic Recording ◽  
Magnetic Thin Films ◽  
Magnetic Films ◽  
Substrate Bias ◽  
Epitaxial Relationship ◽  
Transmission Electron

Cr thin films are often used as underlayers for Co alloy magnetic thin films, such as Co1, CoNi2, and CoNiCr3, for high density longitudinal magnetic recording. It is belived that the role of the Cr underlayer is to control the growth and texture of the Co alloy magnetic thin films, and, then, to increase the in plane coercivity of the films. Although many epitaxial relationship between the Cr underlayer and the magnetic films, such as ﹛1010﹜Co/ {110﹜Cr4, ﹛2110﹜Co/ ﹛001﹜Cr5, ﹛0002﹜Co/﹛110﹜Cr6, have been suggested and appear to be related to the Cr thickness, the texture of the Cr underlayer itself is still not understood very well. In this study, the texture of a 2000 Å thick Cr underlayer on Nip/Al substrate for thin films of (Co75Ni25)1-xTix dc-sputtered with - 200 V substrate bias is investigated by electron microscopy.

Magnetic energy distribution in polycrystalline sputtered CoCr magnetic thin films

2008 ◽  
Vol 42 (2) ◽  
pp. 125-128
Author(s):  
J. F. Al-Sharab ◽  
J. E. Wittig ◽  
G. Bertero ◽  
T. Yamashita ◽  
J. Bentley ◽  
...  
Keyword(s):  
Thin Films ◽  
Energy Distribution ◽  
Magnetic Energy ◽  
Magnetic Thin Films

Electrical Anisotropy of Thin Metal Films Growing on Dielectric Substrates

2002 ◽  
Vol 7 (2) ◽  
pp. 45-52
Author(s):  
L. Jakučionis ◽  
V. Kleiza
Keyword(s):  
Magnetic Field ◽  
Thin Films ◽  
Uniaxial Anisotropy ◽  
Metal Films ◽  
Thin Layers ◽  
Electrical Anisotropy ◽  
Electrical Field ◽  
Dielectric Substrates ◽  
Unequal Probability ◽  
Conductive Thin Films

Electrical properties of conductive thin films, that are produced by vacuum evaporation on the dielectric substrates, and which properties depend on their thickness, usually are anisotropic i.e. they have uniaxial anisotropy. If the condensate grow on dielectric substrates on which plane electrical field E is created the transverse voltage U⊥ appears on the boundary of the film in the direction perpendicular to E. Transverse voltage U⊥ depends on the angle γ between the applied magnetic field H and axis of light magnetisation. When electric field E is applied to continuous or grid layers, U⊥ and resistance R of layers are changed by changing γ. It means that value of U⊥ is the measure of anisotropy magnitude. Increasing voltage U0 , which is created by E, U⊥ increases to certain magnitude and later decreases. The anisotropy of continuous thin layers is excited by inequality of conductivity tensor components σ0 ≠ σ⊥. The reason of anisotropy is explained by the model which shows that properties of grain boundaries are defined by unequal probability of transient of charge carrier.

Sign in / Sign up

Export Citation Format

Share Document