Microstructural Study on the Functionally Graded Magnetic Thin Films Prepared by Electroless Deposition

2000 ◽  
Vol 147 (1) ◽  
pp. 160 ◽  
Author(s):  
Takayuki Homma ◽  
Yosuke Kita ◽  
Tetsuya Osaka
2009 ◽  
Vol 16 (04) ◽  
pp. 635-642 ◽  
Author(s):  
YUNDAN YU ◽  
GUOYING WEI ◽  
HONGLIANG GE ◽  
YING GAO ◽  
ZHEN ZHAO ◽  
...  

An alkaline bath was developed for electroless deposition of Co – W – P thin films on a copper substrate. Effects of pH values, various concentrations of reducing agent, and different powers of ultrasonic on composition, microstructure, and magnetic properties of the films were investigated. It was found out that higher pH could improve cobalt atomic percentage and reduce amounts of phosphorus and tungsten in the film while larger amounts of NaH 2 PO 2 would decrease the cobalt content but increase the tungsten and phosphors content. The ultrasonic was introduced during the electroless deposition. Few effects of ultrasonic on the cobalt content were observed. X-ray diffraction showed that almost all of the deposited films were crystalline and contained hexagonal cobalt with a preferred crystallographic orientation (002). However, a typical amorphous Co – W – P film, which has smooth surface, and no crystallite with definite grains could be obtained when the concentration of NaH 2 PO 2 in the bath was over 1.2 mol/L. The films with rougher and agglomerate nodular structures would be formed in the bath with a higher pH value. Certain power (60 W, 40 kHz) of ultrasonic could smash the grains and led to the formation of a denser and smoother surface. Cracks appeared at the surface of the film when the ultrasonic power was 150 W. Vibration sample magnetometer results showed that the film with maximum magnetization (600 emu/g) and coercivity (1000 Oe) could be achieved when introducing ultrasonic (60 W, 40 kHz) during the deposition.


2010 ◽  
Vol 519 (4) ◽  
pp. 1259-1265 ◽  
Author(s):  
Guoying Wei ◽  
Yibiao Jin ◽  
Yundan Yu ◽  
Hongliang Ge ◽  
Xinyan Wang ◽  
...  

Author(s):  
L. Tang ◽  
G. Thomas ◽  
M. R. Khan ◽  
S. L. Duan

Cr thin films are often used as underlayers for Co alloy magnetic thin films, such as Co1, CoNi2, and CoNiCr3, for high density longitudinal magnetic recording. It is belived that the role of the Cr underlayer is to control the growth and texture of the Co alloy magnetic thin films, and, then, to increase the in plane coercivity of the films. Although many epitaxial relationship between the Cr underlayer and the magnetic films, such as ﹛1010﹜Co/ {110﹜Cr4, ﹛2110﹜Co/ ﹛001﹜Cr5, ﹛0002﹜Co/﹛110﹜Cr6, have been suggested and appear to be related to the Cr thickness, the texture of the Cr underlayer itself is still not understood very well. In this study, the texture of a 2000 Å thick Cr underlayer on Nip/Al substrate for thin films of (Co75Ni25)1-xTix dc-sputtered with - 200 V substrate bias is investigated by electron microscopy.


2008 ◽  
Vol 42 (2) ◽  
pp. 125-128
Author(s):  
J. F. Al-Sharab ◽  
J. E. Wittig ◽  
G. Bertero ◽  
T. Yamashita ◽  
J. Bentley ◽  
...  

2000 ◽  
Vol 454-456 ◽  
pp. 723-728 ◽  
Author(s):  
H. Magnan ◽  
P. Le Fèvre ◽  
A. Midoir ◽  
D. Chandesris ◽  
H. Jaffrès ◽  
...  

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