Evolution of a Plasma Plume From a Shower Anode in a Vacuum Arc With a Black-Body Electrode Configuration

2011 ◽  
Vol 39 (11) ◽  
pp. 2838-2839 ◽  
Author(s):  
I. I. Beilis ◽  
Y. Koulik ◽  
R. L. Boxman
Keyword(s):  
Plasma Plume ◽  
Black Body ◽  
Electrode Configuration ◽  
Vacuum Arc

Cu Ion Current Measurements in a Vacuum Arc With a Black Body Electrode Configuration

2013 ◽  
Vol 41 (8) ◽  
pp. 1987-1991 ◽  
Author(s):  
Isak I. Beilis ◽  
Yosef Koulik ◽  
Raymond L. Boxman
Keyword(s):  
Black Body ◽  
Electrode Configuration ◽  
Ion Current ◽  
Vacuum Arc

Effective Cathode Voltage in a Vacuum Arc With a Black Body Electrode Configuration

2013 ◽  
Vol 41 (8) ◽  
pp. 1992-1995 ◽  
Author(s):  
Isak I. Beilis ◽  
Yosef Koulik ◽  
Raymond L. Boxman
Keyword(s):  
Black Body ◽  
Electrode Configuration ◽  
Vacuum Arc ◽  
Cathode Voltage

Cu film deposition using a vacuum arc with a black-body electrode assembly

2014 ◽  
Vol 258 ◽  
pp. 908-912 ◽  
Author(s):  
I.I. Beilis ◽  
Y. Koulik ◽  
R.L. Boxman
Keyword(s):  
Black Body ◽  
Film Deposition ◽  
Vacuum Arc ◽  
Cu Film

Observation of the Plasma Plume at the Anode of High-Current Vacuum Arc

2011 ◽  
Vol 39 (6) ◽  
pp. 1291-1295 ◽  
Author(s):  
A V Batrakov ◽  
S A Popov ◽  
A V Schneider ◽  
G Sandolache ◽  
S W Rowe
Keyword(s):  
Plasma Plume ◽  
Vacuum Arc ◽  
High Current

Imaging of the anode plasma plume development in a hot refractory anode vacuum arc

2005 ◽  
Vol 33 (2) ◽  
pp. 408-409 ◽  
Author(s):  
I.I. Beilis ◽  
A. Shashurin ◽  
A. Nemirovsky ◽  
R.L. Boxman ◽  
S. Goldsmith
Keyword(s):  
Plasma Plume ◽  
Vacuum Arc ◽  
Anode Plasma

Preparation and characterization of thin films of carbon nitride

1995 ◽  
Vol 53 ◽  
pp. 104-105
Author(s):  
L. Wan ◽  
R. F. Egerton
Keyword(s):  
Carbon Nitride ◽  
Arc Discharge ◽  
Ion Beam ◽  
Chemical Vapor ◽  
Reactive Sputtering ◽  
Vacuum Arc ◽  
Specimen Preparation ◽  
Bonding Structure ◽  
Electron Energy Loss

INTRODUCTION Recently, a new compound carbon nitride (CNx) has captured the attention of materials scientists, resulting from the prediction of a metastable crystal structure β-C3N4. Calculations showed that the mechanical properties of β-C3N4 are close to those of diamond. Various methods, including high pressure synthesis, ion beam deposition, chemical vapor deposition, plasma enhanced evaporation, and reactive sputtering, have been used in an attempt to make this compound. In this paper, we present the results of electron energy loss spectroscopy (EELS) analysis of composition and bonding structure of CNX films deposited by two different methods.SPECIMEN PREPARATION Specimens were prepared by arc-discharge evaporation and reactive sputtering. The apparatus for evaporation is similar to the traditional setup of vacuum arc-discharge evaporation, but working in a 0.05 torr ambient of nitrogen or ammonia. A bias was applied between the carbon source and the substrate in order to generate more ions and electrons and change their energy. During deposition, this bias causes a secondary discharge between the source and the substrate.

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