Uniform and Gaussian Uv Light Intensity Distribution on Droplet for Selective Area Deposition of Particles

2021 ◽  
Author(s):  
Tianyi Li ◽  
Aravinda Kar ◽  
Ranganathan Kumar
2009 ◽  
Vol 16-19 ◽  
pp. 675-679 ◽  
Author(s):  
Guang Shen Xu ◽  
Xun Ming Ma ◽  
Huan Pan ◽  
Song Qiao Hu

In order to fabricate micro/meso structures, a novel micro-stereolithography (SL) system with dynamic pattern generator using digital micro-mirror device (DMD) has been investigated. The micro-stereolithography system solidifies photo-sensitive resin with image mask generated by dynamic pattern generator. The micro-stereolithography system is made up of dynamic pattern generator, recoating system and control system. The dynamic pattern generator consists of parabolic concentrator, UV lamp, collimating lens, shutter, DMD and its control, lens and computer. UV light intensity distribution in the imaging plane is investigated. Uniformity UV light intensity distribution is obtained in the imaging plane with changing small area’s gray-scale, and the difference between maximum and minimum value of UV light intensity is 0.4µW/cm2. Small size parts with intricate microstructures have been fabricated with the novel SL system. Compared with laser scanning SL system, the advantage of the novel micro-SL system is that the new SL system can build small objects having micro-structures with low cost in shorter time. The novel micro-SL system provides a solution to the problem that has hampered the progress of SL process into high resolution with low cost.


2010 ◽  
Vol 97-101 ◽  
pp. 3985-3988 ◽  
Author(s):  
Guang Shen Xu ◽  
Huan Pan ◽  
Xun Ming Ma ◽  
Sheng Luo ◽  
Rong Hua Qiu

The non-uniformity distribution of UV light intensity in the imaging plane of integral micro-Stereolithography (µSL) System will induces serious distortion of object in building process, and the building accuracy of the SL system can not be assured. To obtain uniformity distribution of UV light intensity, experimental investigations were performed to research the relationship of UV light intensity with position (x,y) in the imaging plane and gray-scale z of the pattern in the integral µSL System. Based on the experiment results, the model of UV light intensity was established with least squares method. According to the model, for a given point in the imaging plane of the µSL system, the UV light intensity can be changed with varying the gray-scale of the pattern. As a result, Uniformity UV light intensity distribution is obtained in the imaging plane, and the difference between maximum and minimum value of UV light intensity is 0.06µW/cm2. The uniformity UV light intensity distribution provides a foundation for building accurate microstructures with the µSL system.


Crystals ◽  
2018 ◽  
Vol 8 (9) ◽  
pp. 335 ◽  
Author(s):  
Wei-Hsiung Tseng ◽  
Diana Juan ◽  
Wei-Cheng Hsiao ◽  
Cheng-Han Chan ◽  
Hsin-Yi Ma ◽  
...  

In this study, our proposed ultraviolet light-emitting diode (UV LED) mosquito-trapping lamp is designed to control diseases brought by insects such as mosquitoes. In order to enable the device to efficiently catch mosquitoes in a wider area, a secondary freeform lens (SFL) is designed for UV LED. The lens is mounted on a 3 W UV LED light bar as a mosquito-trapping lamp of the new UV LED light bar module to achieve axially symmetric light intensity distribution. The special SFL is used to enhance the trapping capabilities of the mosquito-trapping lamp. The results show that when the secondary freeform surface lens is applied to the experimental outdoor UV LED mosquito-trapping lamp, the trapping range can be expanded to 100π·m2 and the captured mosquitoes increased by about 300%.


1995 ◽  
Author(s):  
Keisuke Tsudaka ◽  
Manabu Tomita ◽  
Minoru Sugawara ◽  
Hiroichi Kawahira ◽  
Satoru Nozawa

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