Interface Shape and Thermally-Driven Convection in Vertical Bridgman Growth of Gallium Selenide: A Semiconductor With Anisotropic Solid-Phase Thermal Conductivity

2001 ◽  
Vol 123 (4) ◽  
pp. 729-740 ◽  
Author(s):  
Hanjie Lee ◽  
Arne J. Pearlstein

For vertical Bridgman growth of thermally anisotropic semiconductors, we present a detailed model accounting for heat transfer, flow driven by thermal buoyancy and solidification shrinkage, and interface deformation. The model allows for anisotropic solid-phase thermal conductivity, characteristic of nonlinear optical materials, as well as conduction in the ampoule wall, and conduction and convection in the liquid. The interface shape is determined as part of the solution of a moving boundary problem. For the nonlinear optical material gallium selenide and a range of growth conditions of practical interest, we present steady axisymmetric computations of the isotherms, flow, and interface shape. For ampoule-wall temperature profiles typical of three-zone Bridgman furnaces, the strength of the flow and deflection of the interface increase considerably with increasing growth rate, while the temperature distribution is relatively insensitive, except near the interface. Interface deflection decreases as the maximum ampoule-wall temperature gradient increases. The flow depends significantly on whether the melting temperature is “centered” between the high and low temperatures. The 23°C uncertainty in the melting temperature of GaSe is shown to have little effect on the flow and interface shape over the entire range of growth conditions. We show that properly accounting for thermal anisotropy is critical to predicting the flow and interface shape, both of which are relatively insensitive to the temperature dependence of the viscosity and thermal conductivities. We also show that localized heating along the ampoule wall can both reverse the direction of flow along the interface, which is expected to significantly influence distribution of dopants or impurities in the solid phase, as well as reduce interfacial curvature. When GaSe is grown under zero gravity conditions, the only flow is due to solidification shrinkage, and is essentially normal to the interface, whose shape is similar to those computed at normal gravity. Comparison of results for GaSe to previous work for benzene, a surrogate for organic nonlinear optical materials, shows that the qualitatively different results are associated with differences in the anisotropy of the thermal conductivity.

1995 ◽  
Vol 413 ◽  
Author(s):  
R. Schlesser ◽  
T. Dietrich ◽  
Z. Sitar ◽  
P. Günter

ABSTRACTThin films of the organic nonlinear optical materials 4‘-nitrobenzylidene-3-acetamino-4- methoxy-aniline (MNBA), and 2-cyclooctylamino-5-nitropyridine (COANP) have been deposited by organic molecular beam epitaxy. Homoepitaxial growth has been demonstrated for both materials. MNBA thin films were grown heteroepitaxially on lattice-matched ethylenediammonium terephthalate (EDT) substrates. Under optimum growth conditions, similar to those valid for homoepitaxial growth of the same material, i.e. at substrate temperatures of 80°C, and growth rates of 0.1 Å/s, highly oriented films were deposited in an island growth mode. Nonlinear optical second-harmonic generation experiments confirmed the macroscopic orientation of the deposited MNBA thin films. Growth experiments with MNBA and COANP on inorganic substrates lead to amorphous or polycrystalline films, depending primarily on the substrate temperature. A spontaneous recrystallization process, occurring in COANP thin films under ambiant conditions, led to the formation of macroscopic nonlinear optically active domain structures.


2000 ◽  
Author(s):  
P. M. Tentzepis ◽  
P. Chen ◽  
I. V. Tomov ◽  
A. S. Dvornikov ◽  
D. A. Oulianov

1989 ◽  
Vol 160 ◽  
Author(s):  
T. L. Lin ◽  
C. W. Nieh

AbstractEpitaxial IrSi3 films have been grown on Si (111) by molecular beam epitaxy (MBE) at temperatures ranging from 630 to 800 °C and by solid phase epitaxy (SPE) at 500 °C. Good surface morphology was observed for IrSi3 layers grown by MBE at temperatures below 680 °C, and an increasing tendency to form islands is noted in samples grown at higher temperatures. Transmission electron microscopy (TEM) analysis reveals that the IrSi3 layers grow epitaxially on Si(111) with three epitaxial modes depending on the growth conditions. For IrSi3 layers grown by MBE at 630 °C, two epitaxial modes were observed with ~ 50% area coverage for each mode. Single mode epitaxial growth was achieved at a higher MBE growth temperature, but with island formation in the IrSi3 layer. A template technique was used with MBE to improve the IrSi3 surface morphology at higher growth temperatures. Furthermore, single-crystal IrSi3 was grown on Si(111) at 500 °C by SPE, with annealing performed in-situ in a TEM chamber.


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