Creation of Nanometer-Sized Features in Polysilicon Using Fusing
Abstract Current microfabrication systems can achieve resolutions of approximately 0.1μm. We present physical methods for creating structures with length scales and characteristic dimensions significantly below current fabrication resolutions. These structures, themselves fabricated in conventional, gross-resolution (greater than 2μm) semiconductor facilities, undergo structural change to create features below the lithography limits of the fabrication process. These devices — dog-boned microfabricated polysilicon fuses — are heated just below melting, and a small perturbation current heats a narrow, necked region of the beam, resulting in fusing. Infrastructure has already been constructed to create gross-resolution structures in microfabrication. Novel processes and mechanisms are needed to utilize these resolutions and create structures capable of addressing biological systems, functioning quantum mechanically, use single electrons, or require extreme speeds.