Compensation for transient chamber wall condition using real-time plasma density feedback control in an inductively coupled plasma etcher
2003 ◽
Vol 21
(3)
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pp. 706-717
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1996 ◽
Vol 143
(4)
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pp. 1375-1383
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2011 ◽
Vol 39
(11)
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pp. 2536-2537
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2002 ◽
Vol 20
(1)
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pp. 43-52
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2005 ◽
Vol 23
(2)
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pp. 281-287
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1996 ◽
Vol 51
(12)
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pp. 1443-1450
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