Etching mechanism of (Pb,Sr)TiO3 thin films for DRAM application using Cl2/Ar inductively coupled plasma

Vacuum ◽  
2004 ◽  
Vol 74 (3-4) ◽  
pp. 485-489 ◽  
Author(s):  
Gwan-Ha Kim ◽  
Kyoung-Tae Kim ◽  
Dong-Pyo Kim ◽  
Chang-Il Kim
Keyword(s):  
Thin Films ◽  
Inductively Coupled Plasma ◽  
Inductively Coupled ◽  
Etching Mechanism

Effect of silane/hydrogen ratio on microcrystalline silicon thin films by remote inductively coupled plasma

2013 ◽  
Vol 113 (20) ◽  
pp. 203505 ◽  
Author(s):  
Y. N. Guo ◽  
D. Y. Wei ◽  
S. Q. Xiao ◽  
S. Y. Huang ◽  
H. P. Zhou ◽  
...  
Keyword(s):  
Thin Films ◽  
Inductively Coupled Plasma ◽  
Microcrystalline Silicon ◽  
Inductively Coupled ◽  
Silicon Thin Films

Etching mechanism of MgO thin films in inductively coupled Cl2∕Ar plasma

2004 ◽  
Vol 22 (5) ◽  
pp. 2101-2106 ◽  
Author(s):  
A. M. Efremov ◽  
Seong-Mo Koo ◽  
Dong-Pyo Kim ◽  
Kyoung-Tae Kim ◽  
Chang-Il Kim
Keyword(s):  
Thin Films ◽  
Inductively Coupled ◽  
Etching Mechanism ◽  
Ar Plasma

Etching mechanisms of (Ba,Sr)TiO3 thin films in CF4/Ar inductively coupled plasma

2004 ◽  
Vol 71 (1) ◽  
pp. 54-62 ◽  
Author(s):  
A.M Efremov ◽  
Dong-Pyo Kim ◽  
Kyoung-Tae Kim ◽  
Chang-Il Kim
Keyword(s):  
Thin Films ◽  
Inductively Coupled Plasma ◽  
Inductively Coupled
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