Role of hydrogen on the deposition and properties of fluorinated silicon-nitride films prepared by inductively coupled plasma enhanced chemical vapor deposition using SiF4∕N2∕H2 mixtures
2005 ◽
Vol 23
(2)
◽
pp. 248-255
◽
2010 ◽
Vol 204
(18-19)
◽
pp. 2923-2927
◽
2000 ◽
Vol 18
(2)
◽
pp. 372-376
◽
2015 ◽
Vol 71
◽
pp. 384-388
◽
2002 ◽
Vol 74
(1-4)
◽
pp. 97-105
◽
2014 ◽
Vol 67
◽
pp. 197-201
◽
1997 ◽
Vol 15
(5)
◽
pp. 2644-2652
◽
2013 ◽
Vol 13
(9)
◽
pp. 6326-6332
2001 ◽
Vol 80
(1-3)
◽
pp. 252-256
◽