Thermal atomic layer etching of HfO2 using HF for fluorination and TiCl4 for ligand-exchange
2018 ◽
Vol 36
(6)
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pp. 061504
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2016 ◽
Vol 28
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pp. 7657-7665
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1995 ◽
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pp. 966-971
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2013 ◽
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Vol 35
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pp. 05C302
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