End point detection in ion milling processes by sputter‐induced optical emission spectroscopy

1984 ◽  
Vol 2 (2) ◽  
pp. 481-484 ◽  
Author(s):  
C. Lu ◽  
M. Dorian ◽  
M. Tabei ◽  
A. Elsea
Keyword(s):  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
Ion Milling ◽  
End Point ◽  
End Point Detection ◽  
Point Detection

Monitoring of Sidewall Spacer Etch by Optical Emission Spectroscopy and Mass Spectroscopy

1997 ◽  
Vol 502 ◽  
Author(s):  
K. Min ◽  
J. J. Chambers ◽  
G. N. Parsons ◽  
J. R. Hauser
Keyword(s):  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Electron Cyclotron Resonance ◽  
Optical Emission ◽  
Cross Sectional ◽  
End Point ◽  
Selective Etch ◽  
End Point Detection ◽  
Point Detection ◽  
Sectional Analysis

ABSTRACTSelective etch of SiO2/poly Si in a high density CF4+D2 plasma generated by ECR (Electron Cyclotron Resonance) system was studied. The end point detection of the SiO2 sidewall spacer etch was monitored using optical emission spectroscopy and mass spectrometer. SEM cross sectional analysis was conducted to confirm the end point detection and spacer formation.

Etch end-point detection of GaN-based devices using optical emission spectroscopy

2001 ◽  
Vol 82 (1-3) ◽  
pp. 159-162 ◽  
Author(s):  
H.S. Kim ◽  
Y.J. Sung ◽  
D.W. Kim ◽  
T. Kim ◽  
M.D. Dawson ◽  
...  
Keyword(s):  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
End Point ◽  
End Point Detection ◽  
Point Detection

Grazing angle optical emission interferometry for end‐point detection

1991 ◽  
Vol 58 (3) ◽  
pp. 240-242 ◽  
Author(s):  
David Angell ◽  
Gottlieb S. Oehrlein
Keyword(s):  
Grazing Angle ◽  
Optical Emission ◽  
End Point ◽  
End Point Detection ◽  
Point Detection
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