Low‐temperature growth of aluminum nitride thin films on silicon by reactive radio frequency magnetron sputtering*

1996 ◽  
Vol 14 (4) ◽  
pp. 2238-2242 ◽  
Author(s):  
Chien‐Chuan Cheng ◽  
Ying‐Chung Chen ◽  
Horng‐Jwo Wang ◽  
Wen‐Rong Chen
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Aluminum Nitride ◽  
Magnetron Sputtering ◽  
Radio Frequency ◽  
Radio Frequency Magnetron ◽  
Radio Frequency Magnetron Sputtering ◽  
Temperature Growth ◽  
Low Temperature Growth

Nitrogen Doping into Cu2O Thin Films Deposited by Reactive Radio-Frequency Magnetron Sputtering

2001 ◽  
Vol 40 (Part 1, No. 4B) ◽  
pp. 2765-2768 ◽  
Author(s):  
Shogo Ishizuka ◽  
Shinya Kato ◽  
Takahiro Maruyama ◽  
Katsuhiro Akimoto
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Radio Frequency ◽  
Nitrogen Doping ◽  
Radio Frequency Magnetron ◽  
Radio Frequency Magnetron Sputtering ◽  
Cu2o Thin Films
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