Erratum: ‘‘Ballistic electron emission microscopy investigation of SiGe nanostructures fabricated using reactive-ion etching’’ [J. Vac. Sci. Technol. B 10, 3112 (1992)]
1993 ◽
Vol 11
(3)
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pp. 766
◽
1992 ◽
Vol 10
(6)
◽
pp. 3112
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1997 ◽
Vol 12
(7)
◽
pp. 907-912
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2001 ◽
Vol 66
(1-2)
◽
pp. 3-51
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