Reactive ion etching of Pb(Zr[sub x]Ti[sub 1−x])O[sub 3] thin films in an inductively coupled plasma
1998 ◽
Vol 16
(4)
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pp. 1894
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2007 ◽
Vol 90
(1)
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pp. 95-106
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2008 ◽
Vol 14
(3)
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pp. 297-302
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2009 ◽
Vol 129
(4)
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pp. 105-109
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2008 ◽
Vol 11
(2)
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pp. D23
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