Quasi-atomic layer etching of Si and nitride hard mask with Cl2 based chemistry
1995 ◽
Vol 13
(3)
◽
pp. 966-971
◽
2013 ◽
Vol 31
(6)
◽
pp. 061310
◽
Keyword(s):
2017 ◽
Vol 9
(39)
◽
pp. 34435-34447
◽
2017 ◽
Vol 35
(5)
◽
pp. 05C302
◽
2018 ◽
Vol 30
(23)
◽
pp. 8465-8475
◽