Optical and electron paramagnetic resonance studies of hydrogenated amorphous carbon (a-C:H) thin films formed by direct ion beam deposition method

2001 ◽  
Author(s):  
M. Silinskas ◽  
A. Grigonis ◽  
G. Dikcius ◽  
H. Manikowski
Keyword(s):  
Thin Films ◽  
Electron Paramagnetic Resonance ◽  
Amorphous Carbon ◽  
Ion Beam ◽  
Deposition Method ◽  
Paramagnetic Resonance ◽  
Ion Beam Deposition ◽  
Hydrogenated Amorphous ◽  
Electron Paramagnetic ◽  
Beam Deposition

Influence of substrate bias voltage on properties of Pt thin films deposited by non-mass separated ion beam deposition method

2009 ◽  
Vol 63 (26) ◽  
pp. 2181-2184 ◽  
Author(s):  
Joon Woo Bae ◽  
Jae-Won Lim ◽  
Kouji Mimura ◽  
Masahito Uchikoshi ◽  
Mitsuhiro Wada ◽  
...  
Keyword(s):  
Thin Films ◽  
Bias Voltage ◽  
Ion Beam ◽  
Substrate Bias ◽  
Deposition Method ◽  
Substrate Bias Voltage ◽  
Ion Beam Deposition ◽  
Influence Of Substrate ◽  
Beam Deposition

Characterization of mechanical, optical and structural properties of bismuth oxide thin films as a write-once medium for blue laser recording

2014 ◽  
Vol 1633 ◽  
pp. 87-92 ◽  
Author(s):  
M. Martyniuk ◽  
D. Baldwin ◽  
R. Jeffery ◽  
K.K.M.B.D. Silva ◽  
R.C. Woodward ◽  
...  
Keyword(s):  
Thin Films ◽  
Bismuth Oxide ◽  
Ion Beam ◽  
Blue Laser ◽  
Oxide Thin Film ◽  
Deposition Method ◽  
Oxide Thin Films ◽  
Ion Beam Deposition ◽  
Beam Deposition

ABSTRACTWe report on the preparation and characterization of crystalline bismuth oxide thin films via Biased Target Ion Beam Deposition method. A focused blue laser (405nm) is used to write an array of dots in the bismuth oxide thin film and demonstrate clear and circular recording marks in form of “bubbles” or “little volcanos” (FWHM ∼500nm). Results indicate excellent static recording characteristics, writing sensitivity and contrast. The recording mechanism is investigated and is believed to be related to laser-induced morphology change.

Microstructure and Adhesion Properties of a-CN and Ti/a-CN Nanocomposite Thin Films Prepared by Hybrid Ion Beam Deposition Technique

2014 ◽  
Vol 938 ◽  
pp. 36-39
Author(s):  
P. Vijai Bharathy ◽  
Q. Yang ◽  
D. Nataraj
Keyword(s):  
Thin Films ◽  
Adhesion Strength ◽  
Amorphous Carbon ◽  
Carbon Nitride ◽  
Ion Beam ◽  
Deposition Technique ◽  
Nanomechanical Properties ◽  
Ion Beam Deposition ◽  
Amorphous Carbon Nitride ◽  
Beam Deposition

Carbon based materials have attracted much for its unique surface microstructure and nanomechanical properties among researchers. In this study, the influence of microstructure on the nanomechanical properties of thin carbon based films was studied in detail. For which amorphous Carbon nitride (a-CN) and Titanium incorporated amorphous Carbon nitride (Ti/a-CN) thin films were prepared with a thickness of less than 100 nm using hybrid ion beam deposition technique. The incorporation of Ti into the a-CN matrix greatly modified the sp3/sp2 hybridized bonding ratio and it is reflected in the mechanical hardness of Ti/a-CN thin film. Most of the incorporated Ti reacts with carbon and nitrogen to form TiN and TiCN phases respectively. On the other hand, owing to the usage of energetic ion bombardment and the presence of TiN/TiCN phases in the carbon nitride matrix, the Ti/a-CN nanocomposite film shows improved adhesion strength compared to that of pure a-CN film. Overall the presence of hard metallic phase in the amorphous carbon network alters the microstructure and improves the adhesion strength of a-CN films suitable for protective coating applications.

Electron energy loss spectroscopy of diamond-like carbon thin films

1992 ◽  
Vol 50 (2) ◽  
pp. 1272-1273
Author(s):  
J. Kulik ◽  
Y. Lifshitz ◽  
G.D. Lempert ◽  
S. Rotter ◽  
J.W. Rabalais ◽  
...  
Keyword(s):  
Thin Films ◽  
Energy Loss ◽  
Electron Energy ◽  
Ion Beam ◽  
Diamond Like Carbon ◽  
Ion Beam Deposition ◽  
Chemistry Research ◽  
Carbon Thin Films ◽  
Electron Energy Loss ◽  
Beam Deposition

Carbon thin films with diamond-like properties have generated significant interest in condensed matter science in recent years. Their extreme hardness combined with insulating electronic characteristics and high thermal conductivity make them attractive for a variety of uses including abrasion resistant coatings and applications in electronic devices. Understanding the growth and structure of such films is therefore of technological interest as well as a goal of basic physics and chemistry research. Recent investigations have demonstrated the usefulness of energetic ion beam deposition in the preparation of such films. We have begun an electron microscopy investigation into the microstructure and electron energy loss spectra of diamond like carbon thin films prepared by energetic ion beam deposition.The carbon films were deposited using the MEIRA ion beam facility at the Soreq Nuclear Research Center in Yavne, Israel. Mass selected C+ beams in the range 50 to 300 eV were directed onto Si {100} which had been etched with HF prior to deposition.

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