Evalution of 193-nm alternating-aperture phase-shift mask dry etch processes
2006 ◽
Vol 45
(11)
◽
pp. 8920-8924
◽
2002 ◽
1997 ◽
Vol 15
(6)
◽
pp. 2259
◽
1996 ◽
Vol 14
(6)
◽
pp. 3719
◽