Surface modification of a MoSiON phase shift mask to reduce critical dimension variation after exposure to a 193-nm ArF excimer laser

2014 ◽  
Vol 311 ◽  
pp. 831-836
Author(s):  
Hyeokseong Choo ◽  
Dongwan Seo ◽  
Sangwoo Lim
Keyword(s):  
Surface Modification ◽  
Phase Shift ◽  
Excimer Laser ◽  
Critical Dimension ◽  
Arf Excimer Laser ◽  
193 Nm ◽  
Phase Shift Mask

Fabrication of 0.1 µm Patterns Using an Alternating Phase Shift Mask in ArF Excimer Laser Lithography

1997 ◽  
Vol 36 (Part 1, No. 12B) ◽  
pp. 7488-7493 ◽  
Author(s):  
Keisuke Nakazawa ◽  
Masaya Uematsu ◽  
Toshio Onodera ◽  
Kazuya Kamon ◽  
Tohru Ogawa ◽  
...  
Keyword(s):  
Phase Shift ◽  
Excimer Laser ◽  
Laser Lithography ◽  
Arf Excimer Laser ◽  
Phase Shift Mask ◽  
Alternating Phase Shift Mask

Development of ZrSiO attenuated phase-shift mask for ArF excimer laser lithography

1999 ◽  
Author(s):  
Nobuhiko Fukuhara ◽  
Takashi Haraguchi ◽  
Koichiro Kanayama ◽  
Tadashi Matsuo ◽  
Susumu Takeuchi ◽  
...  
Keyword(s):  
Phase Shift ◽  
Excimer Laser ◽  
Laser Lithography ◽  
Arf Excimer Laser ◽  
Phase Shift Mask

scholarly journals 193-nm deep-UV lithography system using a line-narrowed ArF excimer laser

1993 ◽  
Author(s):  
Bruce W. Smith ◽  
Malcolm C. Gower ◽  
Mark Westcott ◽  
Lynn F. Fuller
Keyword(s):  
Excimer Laser ◽  
Uv Lithography ◽  
Arf Excimer Laser ◽  
Deep Uv ◽  
193 Nm ◽  
Lithography System

Study and improvement approach to 193-nm radiation damage of attenuated phase-shift mask

2010 ◽  
Author(s):  
Yoshifumi Sakamoto ◽  
Tomohito Hirose ◽  
Hitomi Tsukuda ◽  
Taichi Yamazaki ◽  
Yosuke Kojima ◽  
...  
Keyword(s):  
Phase Shift ◽  
Radiation Damage ◽  
193 Nm ◽  
Phase Shift Mask

Growth of Silicon Films Onto Fluororesin Surface by ArF Excimer Laser

1993 ◽  
Vol 334 ◽  
Author(s):  
T. Miyokawa ◽  
M. Okoshi ◽  
K. Toyoda ◽  
M. Murahara
Keyword(s):  
Surface Roughness ◽  
Surface Modification ◽  
Excimer Laser ◽  
High Density ◽  
Silicon Films ◽  
Chemical Compositions ◽  
Xps Analysis ◽  
Modification Process ◽  
Arf Excimer Laser ◽  
Mixed Gases

AbstractSilicon films were deposited on a fluororesin surface. The process was divided into two steps: surface modification process and silicon CVD onto the modified parts. In the modification process, SiH4 and B(CH3)3 mixed gases were used with ArF excimer laser. Fluorine atoms of the surface were pulled out by boron atoms which were photo—dissociated from B(CH3)3 and were replaced with silicon atoms released from SiH4. In the CVD process, SiH4 gas was used with high—density excited ArF excimer laser. Silicon films were deposited onto the nuclei by photodecomposition of SiH4.Chemical compositions of the modified layers and the deposited parts were inspected by XPS analysis. 1000 Å thickness of the deposited silicon films was confirmed by the surface roughness interference–meter.

scholarly journals Fabrication of Superhydrophobic Silicone Rubber with Periodic Micro/Nano-Suction Cup Structure by ArF Excimer Laser-Induced Photodissociation

Nanomaterials ◽  
2019 ◽  
Vol 9 (6) ◽  
pp. 870 ◽  
Author(s):  
Masayuki Okoshi
Keyword(s):  
Excimer Laser ◽  
Silicone Rubber ◽  
Focal Point ◽  
Pulse Number ◽  
Entire Surface ◽  
Suction Cup ◽  
Atomic Force ◽  
Superhydrophobic Property ◽  
Arf Excimer Laser ◽  
193 Nm

A 193-nm ArF excimer laser was used to induce the photodissociation of Si–O bonds of silicone rubber in order to fabricate a periodic micro/nano-suction cup silicone structure, approximately 1 μm in diameter and 2 μm in height at regular intervals of 2.5 μm. The laser was focused on Al-coated silicone rubber by each silica glass microsphere 2.5 μm in diameter, which covered the entire surface of the silicone rubber. The silicone rubber underneath each microsphere photochemically swelled after laser-ablating the coated Al to limit the diameter of the swelling. Simultaneously, the coated Al was able to adjust the focal point to the surface of the silicone rubber to form a hole approximately 500 nm in diameter, centered at the swollen silicone. The dependences of the thickness of the coated-Al and the laser pulse number are discussed, based on the observations of a scanning electron microscope (SEM) and an atomic force microscope (AFM). The superhydrophobic property of the fabricated micro/nano-suction cup structure was successfully found.

Sign in / Sign up

Export Citation Format

Share Document