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Error budget for a 193-nm complementary phase-shift mask
Mapping Intimacies
◽
10.1117/12.475694
◽
2002
◽
Author(s):
Nicholas K. Eib
◽
Olga Kobozeva
◽
Chris Neville
◽
Ebo H. Croffie
Keyword(s):
Phase Shift
◽
Error Budget
◽
193 Nm
◽
Phase Shift Mask
Download Full-text
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Phase Shift
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Investigation of Optimum Biasing and Undercut for Single Trench Alternating Phase Shift Mask in 193 nm Lithography
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Keyword(s):
Phase Shift
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Plasma reactive ion etching of 193 nm attenuated phase shift mask materials
Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena
◽
10.1116/1.589625
◽
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(6)
◽
pp. 2259
◽
Cited By ~ 13
Author(s):
B. W. Smith
Keyword(s):
Phase Shift
◽
Reactive Ion Etching
◽
Ion Etching
◽
193 Nm
◽
Phase Shift Mask
Download Full-text
Surface modification of a MoSiON phase shift mask to reduce critical dimension variation after exposure to a 193-nm ArF excimer laser
Applied Surface Science
◽
10.1016/j.apsusc.2014.05.174
◽
2014
◽
Vol 311
◽
pp. 831-836
Author(s):
Hyeokseong Choo
◽
Dongwan Seo
◽
Sangwoo Lim
Keyword(s):
Surface Modification
◽
Phase Shift
◽
Excimer Laser
◽
Critical Dimension
◽
Arf Excimer Laser
◽
193 Nm
◽
Phase Shift Mask
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Lateral shearing interferometer for phase-shift mask measurement at 193 nm
10.1117/12.474601
◽
2002
◽
Cited By ~ 2
Author(s):
Gerald Fuetterer
◽
M. Lano
◽
Norbert Lindlein
◽
Johannes Schwider
Keyword(s):
Phase Shift
◽
Lateral Shearing Interferometer
◽
Lateral Shearing
◽
193 Nm
◽
Phase Shift Mask
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Attenuated phase shift mask materials for 248 and 193 nm lithography
Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena
◽
10.1116/1.588655
◽
1996
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B. W. Smith
Keyword(s):
Phase Shift
◽
193 Nm
◽
Phase Shift Mask
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Phase-shift mask issues for 193-nm lithography
10.1117/12.175414
◽
1994
◽
Cited By ~ 2
Author(s):
Bruce W. Smith
◽
Suleyman Turgut
Keyword(s):
Phase Shift
◽
193 Nm
◽
Phase Shift Mask
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Evalution of 193-nm alternating-aperture phase-shift mask dry etch processes
10.1117/12.504198
◽
2003
◽
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◽
Chris Constantine
◽
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◽
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◽
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◽
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Phase Shift
◽
193 Nm
◽
Dry Etch
◽
Phase Shift Mask
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Effect of quartz phase etch on 193-nm alternating phase-shift mask performance for the 100-nm node
10.1117/12.474481
◽
2002
◽
Author(s):
Kyle Patterson
◽
Lloyd C. Litt
◽
John G. Maltabes
◽
Greg P. Hughes
◽
Trish Robertson
◽
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Keyword(s):
Phase Shift
◽
193 Nm
◽
Phase Shift Mask
◽
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Relationship of phase shift mask design and size of three-dimension nanostructures
2020 27th International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD)
◽
10.23919/am-fpd49417.2020.9224493
◽
2020
◽
Author(s):
Pongsakom Sihapitak
◽
Yasuaki Ishikawa
◽
Xudongfang Wang
◽
Mutsunori Uenuma
◽
Yukiharu Uraoka
Keyword(s):
Phase Shift
◽
Three Dimension
◽
Mask Design
◽
Relationship Of
◽
Phase Shift Mask
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