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Lateral shearing interferometer for phase-shift mask measurement at 193 nm
Mapping Intimacies
◽
10.1117/12.474601
◽
2002
◽
Cited By ~ 2
Author(s):
Gerald Fuetterer
◽
M. Lano
◽
Norbert Lindlein
◽
Johannes Schwider
Keyword(s):
Phase Shift
◽
Lateral Shearing Interferometer
◽
Lateral Shearing
◽
193 Nm
◽
Phase Shift Mask
Download Full-text
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References
Diffractive lateral-shearing interferometer for phase-shift mask measurement using an excimer laser source
10.1117/12.611690
◽
2005
◽
Author(s):
Johannes Schwider
◽
Gerald Fuetterer
◽
Norbert Lindlein
Keyword(s):
Phase Shift
◽
Excimer Laser
◽
Laser Source
◽
Lateral Shearing Interferometer
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Lateral Shearing
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Phase Shift Mask
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Study and improvement approach to 193-nm radiation damage of attenuated phase-shift mask
10.1117/12.867710
◽
2010
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Cited By ~ 2
Author(s):
Yoshifumi Sakamoto
◽
Tomohito Hirose
◽
Hitomi Tsukuda
◽
Taichi Yamazaki
◽
Yosuke Kojima
◽
...
Keyword(s):
Phase Shift
◽
Radiation Damage
◽
193 Nm
◽
Phase Shift Mask
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𝛍m-resolution thickness distribution measurement of transparent glass films by using a multi-wavelength phase-shift extraction method in the large lateral shearing interferometer
Optics Express
◽
10.1364/oe.27.002899
◽
2019
◽
Vol 27
(3)
◽
pp. 2899
◽
Cited By ~ 1
Author(s):
Yugang Ren
◽
Zhang Cao
◽
Xiaoyang Tang
◽
Heng Xie
◽
Lijun Xu
Keyword(s):
Phase Shift
◽
Extraction Method
◽
Thickness Distribution
◽
Distribution Measurement
◽
Transparent Glass
◽
Lateral Shearing Interferometer
◽
Lateral Shearing
◽
Multi Wavelength
◽
Glass Films
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Investigation of Optimum Biasing and Undercut for Single Trench Alternating Phase Shift Mask in 193 nm Lithography
Japanese Journal of Applied Physics
◽
10.1143/jjap.45.8920
◽
2006
◽
Vol 45
(11)
◽
pp. 8920-8924
◽
Cited By ~ 1
Author(s):
Ji-Eun Lee
◽
Hye-Young Kang
◽
Dong-Soo Shin
◽
Hee-Jun Jeong
◽
Ilsin An
◽
...
Keyword(s):
Phase Shift
◽
193 Nm
◽
Phase Shift Mask
◽
Alternating Phase Shift Mask
Download Full-text
Error budget for a 193-nm complementary phase-shift mask
10.1117/12.475694
◽
2002
◽
Author(s):
Nicholas K. Eib
◽
Olga Kobozeva
◽
Chris Neville
◽
Ebo H. Croffie
Keyword(s):
Phase Shift
◽
Error Budget
◽
193 Nm
◽
Phase Shift Mask
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Plasma reactive ion etching of 193 nm attenuated phase shift mask materials
Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena
◽
10.1116/1.589625
◽
1997
◽
Vol 15
(6)
◽
pp. 2259
◽
Cited By ~ 13
Author(s):
B. W. Smith
Keyword(s):
Phase Shift
◽
Reactive Ion Etching
◽
Ion Etching
◽
193 Nm
◽
Phase Shift Mask
Download Full-text
Surface modification of a MoSiON phase shift mask to reduce critical dimension variation after exposure to a 193-nm ArF excimer laser
Applied Surface Science
◽
10.1016/j.apsusc.2014.05.174
◽
2014
◽
Vol 311
◽
pp. 831-836
Author(s):
Hyeokseong Choo
◽
Dongwan Seo
◽
Sangwoo Lim
Keyword(s):
Surface Modification
◽
Phase Shift
◽
Excimer Laser
◽
Critical Dimension
◽
Arf Excimer Laser
◽
193 Nm
◽
Phase Shift Mask
Download Full-text
Attenuated phase shift mask materials for 248 and 193 nm lithography
Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena
◽
10.1116/1.588655
◽
1996
◽
Vol 14
(6)
◽
pp. 3719
◽
Cited By ~ 6
Author(s):
B. W. Smith
Keyword(s):
Phase Shift
◽
193 Nm
◽
Phase Shift Mask
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Phase-shift mask issues for 193-nm lithography
10.1117/12.175414
◽
1994
◽
Cited By ~ 2
Author(s):
Bruce W. Smith
◽
Suleyman Turgut
Keyword(s):
Phase Shift
◽
193 Nm
◽
Phase Shift Mask
Download Full-text
Evalution of 193-nm alternating-aperture phase-shift mask dry etch processes
10.1117/12.504198
◽
2003
◽
Cited By ~ 1
Author(s):
Jason Plumhoff
◽
Chris Constantine
◽
Jong Shin
◽
B. Reelfs
◽
Emmanuel Rausa
◽
...
Keyword(s):
Phase Shift
◽
193 Nm
◽
Dry Etch
◽
Phase Shift Mask
Download Full-text
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