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Flexible 60-90W ArF light source for double patterning immersion lithography in high volume manufacturing
Mapping Intimacies
◽
10.1117/12.839803
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2009
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Cited By ~ 1
Author(s):
Slava Rokitski
◽
Toshi Ishihara
◽
Rajeskar Rao
◽
Rui Jiang
◽
Daniel Riggs
◽
...
Keyword(s):
Light Source
◽
High Volume
◽
Immersion Lithography
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Double Patterning
Download Full-text
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High reliability ArF light source for double patterning immersion lithography
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◽
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Self-aligned double patterning process for 32/32nm contact/space and beyond using 193 immersion lithography
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Ecology and high-durability injection locked laser with flexible power for double-patterning ArF immersion lithography
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Advanced light source technologies that enable high-volume manufacturing of DUV lithography extensions
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