Infrared Study Of Excimer Laser Induced Surface Modification Of Kapton

1988 ◽  
Author(s):  
S. Mihailov ◽  
W. Duley
Keyword(s):  
Surface Modification ◽  
Excimer Laser ◽  
Infrared Study ◽  
Laser Induced Surface Modification

Excimer laser induced surface modification of thin Ge-Se films

1992 ◽  
Vol 54 ◽  
pp. 345-348 ◽  
Author(s):  
A. Jadin ◽  
M. Wautelet ◽  
L.D. Laude
Keyword(s):  
Surface Modification ◽  
Excimer Laser ◽  
Laser Induced Surface Modification

Surface modification of inorganic solid oxides by excimer laser irradiation

1989 ◽  
Author(s):  
Kaoru Igarashi ◽  
Hideaki Saito ◽  
Tomoo Fujioka ◽  
Satoru Fujitsu ◽  
Kunihito Koumoto ◽  
...  
Keyword(s):  
Surface Modification ◽  
Laser Irradiation ◽  
Excimer Laser ◽  
Solid Oxides ◽  
Excimer Laser Irradiation

Chemical surface modification of fluorocarbon polymers by excimer laser processing

1996 ◽  
Vol 96-98 ◽  
pp. 550-557 ◽  
Author(s):  
Hiroyuki Niino ◽  
Akira Yabe
Keyword(s):  
Surface Modification ◽  
Excimer Laser ◽  
Laser Processing ◽  
Chemical Surface ◽  
Chemical Surface Modification

Laser-induced surface modification of polystyrene

2009 ◽  
Vol 256 (3) ◽  
pp. 857-861 ◽  
Author(s):  
Piotr Rytlewski ◽  
Marian Żenkiewicz
Keyword(s):  
Surface Modification ◽  
Laser Induced Surface Modification

scholarly journals Femtosecond Laser-Induced Surface Modification and its Application

10.5772/65428 ◽  
2016 ◽  
Author(s):  
Kenji Goya ◽  
Masahiko Shiraishi ◽  
Yusuke Fuchiwaki ◽  
Kazuhiro Watanabe ◽  
Toshihiko Ooie
Keyword(s):  
Surface Modification ◽  
Femtosecond Laser ◽  
Laser Induced Surface Modification

Laser induced surface modification of polylactide

2012 ◽  
Vol 212 (8) ◽  
pp. 1700-1704 ◽  
Author(s):  
Piotr Rytlewski ◽  
Waldemar Mróz ◽  
Marian Żenkiewicz ◽  
Joanna Czwartos ◽  
Bogusław Budner
Keyword(s):  
Surface Modification ◽  
Laser Induced Surface Modification

Growth of Silicon Films Onto Fluororesin Surface by ArF Excimer Laser

1993 ◽  
Vol 334 ◽  
Author(s):  
T. Miyokawa ◽  
M. Okoshi ◽  
K. Toyoda ◽  
M. Murahara
Keyword(s):  
Surface Roughness ◽  
Surface Modification ◽  
Excimer Laser ◽  
High Density ◽  
Silicon Films ◽  
Chemical Compositions ◽  
Xps Analysis ◽  
Modification Process ◽  
Arf Excimer Laser ◽  
Mixed Gases

AbstractSilicon films were deposited on a fluororesin surface. The process was divided into two steps: surface modification process and silicon CVD onto the modified parts. In the modification process, SiH4 and B(CH3)3 mixed gases were used with ArF excimer laser. Fluorine atoms of the surface were pulled out by boron atoms which were photo—dissociated from B(CH3)3 and were replaced with silicon atoms released from SiH4. In the CVD process, SiH4 gas was used with high—density excited ArF excimer laser. Silicon films were deposited onto the nuclei by photodecomposition of SiH4.Chemical compositions of the modified layers and the deposited parts were inspected by XPS analysis. 1000 Å thickness of the deposited silicon films was confirmed by the surface roughness interference–meter.

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