Amorphous Silicon Alloy Thin Film Transistor Operation With High Field Effect Mobility

1986 ◽  
Author(s):  
M. Shur ◽  
C. Hyun ◽  
M. Hack ◽  
W. Czubatyj
1993 ◽  
Vol 297 ◽  
Author(s):  
Byung Chul Ahn ◽  
Jeong Hyun Kim ◽  
Dong Gil Kim ◽  
Byeong Yeon Moon ◽  
Kwang Nam Kim ◽  
...  

The hydrogenation effect was studied in the fabrication of amorphous silicon thin film transistor using APCVD technique. The inverse staggered type a-Si TFTs were fabricated with the deposited a-Si and SiO2 films by the atmospheric pressure (AP) CVD. The field effect mobility of the fabricated a-Si TFT is 0.79 cm2/Vs and threshold voltage is 5.4V after post hydrogenation. These results can be applied to make low cost a-Si TFT array using an in-line APCVD system.


2019 ◽  
Vol 40 (9) ◽  
pp. 1443-1446
Author(s):  
Jiseob Lee ◽  
Dongjin Kim ◽  
Suhui Lee ◽  
Johann Cho ◽  
Hyungryul Park ◽  
...  

2009 ◽  
Vol 1 (9) ◽  
pp. 2071-2079 ◽  
Author(s):  
Shou-Zheng Weng ◽  
Paritosh Shukla ◽  
Ming-Yu Kuo ◽  
Yu-Chang Chang ◽  
Hwo-Shuenn Sheu ◽  
...  

2002 ◽  
Vol 80 (14) ◽  
pp. 2517-2519 ◽  
Author(s):  
Patrick R. L. Malenfant ◽  
Christos D. Dimitrakopoulos ◽  
Jeffrey D. Gelorme ◽  
Laura L. Kosbar ◽  
Teresita O. Graham ◽  
...  

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