Crystalline graphite oxide/PVDF nanocomposite gate dielectric: Low-voltage and high field effect mobility thin-film transistor

2012 ◽  
Vol 210 (3) ◽  
pp. 546-552 ◽  
Author(s):  
J. Sannigrahi ◽  
D. Bhadra ◽  
B. K. Chaudhuri
2019 ◽  
Vol 40 (9) ◽  
pp. 1443-1446
Author(s):  
Jiseob Lee ◽  
Dongjin Kim ◽  
Suhui Lee ◽  
Johann Cho ◽  
Hyungryul Park ◽  
...  

2009 ◽  
Vol 1 (9) ◽  
pp. 2071-2079 ◽  
Author(s):  
Shou-Zheng Weng ◽  
Paritosh Shukla ◽  
Ming-Yu Kuo ◽  
Yu-Chang Chang ◽  
Hwo-Shuenn Sheu ◽  
...  

2002 ◽  
Vol 80 (14) ◽  
pp. 2517-2519 ◽  
Author(s):  
Patrick R. L. Malenfant ◽  
Christos D. Dimitrakopoulos ◽  
Jeffrey D. Gelorme ◽  
Laura L. Kosbar ◽  
Teresita O. Graham ◽  
...  

2021 ◽  
Vol 9 (11) ◽  
pp. 1095-1101
Author(s):  
Debabrata Bhadra ◽  

Thin-film transistor (TFT) with various layers of crystalline Poly-vinylidene fluoride (PVDF)/CuO percolative nanocomposites based on Anthracene as a gate dielectric insulator have been fabricated. A device with excellent electrical characteristics at low operating voltages (<1V) has been designed. Different layers (L) of the film were also prepared to achieve the best optimization of ideal gate insulator with various static dielectric constants (εr). Capacitance density, leakage current at 1V gate voltage and electrical characteristics of OFETs with a single and multi layer films have been investigated. This device was showed highest field effect mobility of 2.27 cm2/Vs, a threshold voltage of -1.6V, an exceptionally low sub threshold slope of 380 mV/decade and an on/off ratio of 106. Such a High-ε three layered (3L) PVDF/CuO gate dielectric appears to be highly promising candidates for organic non-volatile memory, sensor and field-effect transistors (FETs).


Author(s):  
Kwang-Ro Yun ◽  
Hwa-Seub Lee ◽  
Jong-Ho Kim ◽  
Tae-Ju Lee ◽  
Jin-Seong Park ◽  
...  

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