Structure and Properties of Ti–B–N, Ti–Cr–B–(N), and Cr–B–(N) Coatings Deposited by Magnetron Sputtering of Targets Prepared by Self-Propagating High-Temperature Synthesis

2005 ◽  
Vol 47 (2) ◽  
pp. 252 ◽  
Author(s):  
D. V. Shtansky
Keyword(s):  
High Temperature ◽  
Magnetron Sputtering ◽  
Structure And Properties ◽  
Temperature Synthesis ◽  
High Temperature Synthesis

Structure and Properties of Electron-Beam Coatings, Overlaid of SHS Composite Powders "TiC – Ti", Synthesized in Air

2016 ◽  
Vol 685 ◽  
pp. 719-723 ◽  
Author(s):  
Maxim G. Krinitcyn ◽  
Gennadii A. Pribytkov ◽  
Vasiliy G. Durakov
Keyword(s):  
Electron Beam ◽  
High Temperature ◽  
Structure And Properties ◽  
Composite Powders ◽  
Temperature Synthesis ◽  
X Ray ◽  
High Temperature Synthesis ◽  
Different Content ◽  
Carbide Particles

A structure of Ti-TiC coatings with different content of titanium binder, overlaid of composite powders, which were obtained by self-propagating high-temperature synthesis, was investigated. The structure was studied by X-ray analysis and metallography. A size of the carbide particles in coatings, hardness of coatings and rate of wear were measured.

Structure and properties of titanium nickelide materials made by self-propagating high-temperature synthesis

1977 ◽  
Vol 20 (12) ◽  
pp. 1631-1633 ◽  
Author(s):  
V. I. Itin ◽  
V. N. Khachin ◽  
A. D. Bratchikov ◽  
V. �. Gyunter ◽  
E. F. Dudarev ◽  
...  
Keyword(s):  
High Temperature ◽  
Titanium Nickelide ◽  
Structure And Properties ◽  
Temperature Synthesis ◽  
High Temperature Synthesis

Properties of WS2 Films Prepared by Magnetron Sputtering from a Nanostructured Target

2013 ◽  
Vol 872 ◽  
pp. 197-200 ◽  
Author(s):  
Yuriy Irtegov ◽  
Vladimir V. An ◽  
Philippe Vinatier ◽  
Nikolay Sochugov ◽  
Alexander Zakharov
Keyword(s):  
High Temperature ◽  
Magnetron Sputtering ◽  
Film Growth ◽  
Tungsten Disulfide ◽  
Main Phase ◽  
Temperature Synthesis ◽  
X Ray ◽  
Growth Orientation ◽  
High Temperature Synthesis ◽  
Nanostructured Target

Tungsten disulfide films were prepared by magnetron sputtering from a laboratory and a nanostructured targets. The nanostructured target was produced from WS2 nanolamellar particles prepared by self-propagating high-temperature synthesis in argon. The main phase in the films was 2H-WS2. According to the X-ray analysis, the films sputtered from the laboratory target and from the nanostructured one reveal different planes of film growth orientation.

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