The effect of Ca, Ba, and V2O5 on oxide-film stability and the mechanism of oxidation of disperse aluminum

2017 ◽  
Vol 53 (5) ◽  
pp. 835-840 ◽  
Author(s):  
V. G. Shevchenko ◽  
V. N. Krasil’nikov ◽  
D. A. Eselevich ◽  
A. V. Konyukova
2011 ◽  
Vol 704-705 ◽  
pp. 1231-1236 ◽  
Author(s):  
Jian Sun ◽  
Xiao Ming Wang ◽  
Zong Shu Zou

Aiming at improving the anti-melting-loss property of the 8407 die steel, room-temperature hard anodization treatment was carried out for aluminized 8407 steel in order to form an oxide film on the surface. The influences of current density and oxidation time on the thickness and hardness of the film were discussed, and the optimum oxidation condition was obtained. The influence mechanism of oxidation condition on thickness and hardness of the film was analyzed. Furthermore, the sectional microstructure and surface morphology of the film were observed by means of OM and SEM, and the phases in the layer were determined by using XRD. The results show that a uniform, compact and tightly united Fe3O4·Al2O3 film has been obtained on the 8407 steel surface after aluminization and subsequent room-temperature hard anodization treatment. Its thickness is 24~67 μm and hardness is 335~382 HV. The optimum oxidation condition is as follows: current density being around 2.5 A/dm2, oxidation time being around 60 minutes and oxidation temperature being around 25 °C.


Author(s):  
Michio Ashida ◽  
Yasukiyo Ueda

An anodic oxide film is formed on aluminum in an acidic elecrolyte during anodizing. The structure of the oxide film was observed directly by carbon replica method(l) and ultra-thin sectioning method(2). The oxide film consists of barrier layer and porous layer constructed with fine hexagonal cellular structure. The diameter of micro pores and the thickness of barrier layer depend on the applying voltage and electrolyte. Because the dimension of the pore corresponds to that of colloidal particles, many metals deposit in the pores. When the oxide film is treated as anode in emulsion of polyelectrolyte, the emulsion particles migrate onto the film and deposit on it. We investigated the behavior of the emulsion particles during electrodeposition.Aluminum foils (99.3%) were anodized in either 0.25M oxalic acid solution at 30°C or 3M sulfuric acid solution at 20°C. After washing with distilled water, the oxide films used as anode were coated with emulsion particles by applying voltage of 200V and then they were cured at 190°C for 30 minutes.


1958 ◽  
Vol 14 (5_6) ◽  
pp. 357-360
Author(s):  
K. C. Grover ◽  
R. C. Mehrotra

1958 ◽  
Vol 14 (5_6) ◽  
pp. 345-356 ◽  
Author(s):  
K. C. Grover ◽  
R. C. Mehrotra

2012 ◽  
Vol 3 (2) ◽  
pp. 131-133
Author(s):  
ANNAPURNA NOWDURI ◽  
◽  
Apparao Babu Duggada ◽  
Vijaya Raju Kurimella

Author(s):  
Wentao Qin ◽  
Dorai Iyer ◽  
Jim Morgan ◽  
Carroll Casteel ◽  
Robert Watkins ◽  
...  

Abstract Ni(5 at.%Pt ) films were silicided at a temperature below 400 °C and at 550 °C. The two silicidation temperatures had produced different responses to the subsequent metal etch. Catastrophic removal of the silicide was seen with the low silicidation temperature, while the desired etch selectivity was achieved with the high silicidation temperature. The surface microstructures developed were characterized with TEM and Auger depth profiling. The data correlate with both silicidation temperatures and ultimately the difference in the response to the metal etch. With the high silicidation temperature, there existed a thin Si-oxide film that was close to the surface and embedded with particles which contain metals. This thin film is expected to contribute significantly to the desired etch selectivity. The formation of this layer is interpreted thermodynamically.


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