INK JET PRINTED THIN FILMS ON GLASS AND POLYIMIDE SUBSTRATES

2013 ◽  
Vol 37 (3) ◽  
pp. 873-883 ◽  
Author(s):  
Tsai-Cheng Li ◽  
Rwei-Ching Chang ◽  
Yen-Choung Li

Silver conductive thin films deposited on glass and polyimide substrates by using ink jet printing are studied in this work. Characterization of the printed thin films and comparison with sputtered films are investigated. The micro texture, residual stress, adhesion, hardness, optical reflectance, and electric resistance of the thin films are discussed. The result shows that the ink jet printing has the possibility to replace sputtering in thin film deposition, especially for the polymer substrates.

2013 ◽  
Vol 284-287 ◽  
pp. 57-61
Author(s):  
Tsai Cheng Li ◽  
Rwei Ching Chang ◽  
Y.C. Li

With the advantage of simplicity and low cost, ink jet printing has the potential to replace the traditional chemical and physical deposition technology in thin film fabrication. In this work, silver conductive thin films are deposited on glass and polyimide substrates by ink jet printing, where some major characteristics of the printed thin films are investigated and compared to those deposited by sputtering. The micro texture and residual stresses of the thin films are measured with X-ray diffractometry (XRD). Using thin film scratch tester, the adhesion of thin films deposited by both ink jet printing and sputtering is studied. Further observations on electric and optical performance by using visible wavelength photospectrometry, four-point probe, and surface profiler are also discussed. The result shows that the micro texture of the printed thin film behaves as good as the sputtered thin film. Furthermore, the micro scratch result illustrates that the adhesion of the printed thin film is even better than the sputtered thin film. It emphasizes that, after certain baking process, the ink jet printing has the possibility to replace sputtering in thin film deposition, especially for the polymer substrates.


2004 ◽  
Vol 450 (2) ◽  
pp. 312-315 ◽  
Author(s):  
Yuming Ai ◽  
Yi Liu ◽  
Tianhong Cui ◽  
Kody Varahramyan

Author(s):  
R. F. Schneidmiller ◽  
W. F. Thrower ◽  
C. Ang

Solid state materials in the form of thin films have found increasing structural and electronic applications. Among the multitude of thin film deposition techniques, the radio frequency induced plasma sputtering has gained considerable utilization in recent years through advances in equipment design and process improvement, as well as the discovery of the versatility of the process to control film properties. In our laboratory we have used the scanning electron microscope extensively in the direct and indirect characterization of sputtered films for correlation with their physical and electrical properties.Scanning electron microscopy is a powerful tool for the examination of surfaces of solids and for the failure analysis of structural components and microelectronic devices.


2015 ◽  
Vol 3 (11) ◽  
pp. 5901-5907 ◽  
Author(s):  
Paul F. Newhouse ◽  
B. A. Parkinson

The photoelectrochemical, optical, and structural properties of semiconducting spinel oxide solid solutions and mixed phase thin films of Co3−xMxO4[M = (Al, Ga, In)] are investigated as a function the Al : Ga : In alloying ratio and the total Co substitution amount,x.


2005 ◽  
Vol 483 (1-2) ◽  
pp. 382-387 ◽  
Author(s):  
Wenfeng Shen ◽  
Yan Zhao ◽  
Caibei Zhang

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