scholarly journals A spectroscopical study of H$$_{2}$$ emission in a simply magnetized toroidal plasma

2021 ◽  
Vol 75 (3) ◽  
Author(s):  
R. Barni ◽  
P. Alex ◽  
E. Ghorbanpour ◽  
C. Riccardi
Keyword(s):  
Emission Spectroscopy ◽  
Molecular Hydrogen ◽  
Optical Emission Spectroscopy ◽  
Tomographic Reconstruction ◽  
Diagnostic Technique ◽  
Optical Emission ◽  
Emission Lines ◽  
Excitation Temperature ◽  
Toroidal Plasma ◽  
Tomographic Method

Abstract A noninvasive diagnostic technique relying on optical emission spectroscopy is used for studying plasma confined in a purely toroidal magnetic field. Visible emission lines of molecular hydrogen were specifically targeted. Bi-dimensional structures and poloidal plasma profiles were reconstructed from the emissivity distribution of hydrogen Fulcher system using a tomographic method. A few details concerning the methods employed to capture different emission viewlines, data reduction and tomographic reconstruction techniques are also addressed. We report also the first measurement of the excitation temperature of the $$\text {H}_2$$ H 2 [3c] level in the center of the plasma column, $$T_{\mathrm{exc}}=0.67 \pm 0.11$$ T exc = 0.67 ± 0.11 eV. Graphic Abstract

Axial uniformity diagnosis of coaxial surface wave linear plasma by optical emission spectroscopy

2021 ◽  
Author(s):  
Wenjin Zhang ◽  
Xinyu Wei ◽  
Longwei Chen ◽  
Qifu Lin ◽  
Yiman Jiang ◽  
...  
Keyword(s):  
Surface Wave ◽  
Electron Density ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
Electron Excitation ◽  
Gas Pressure ◽  
Excitation Temperature ◽  
Density Spectrum ◽  
Linear Plasma

Abstract The coaxial surface wave linear plasma with preeminent axial uniformity is developed with the 2.45 GHz microwave generator. By optical emission spectroscopy, parameters of the argon linear plasma with a length over 600 mm are diagnosed under gas pressure of 30 Pa and 50 Pa and different microwave powers. The spectral lines of argon and Hβ (486.1 nm) atoms in excited state are observed for estimating electron excitation temperature and electron density. Spectrum bands in 305–310 nm of diatomic OH (A2 Σ+-X2 Πi) radicals are used to determine the molecule rotational temperature. Finally, the axial uniformity of electron density and electron excitation temperature are analyzed emphatically under various conditions. The results prove the distinct optimization of compensation from dual powers input, which can narrow the uniform coefficient of electron density and electron excitation temperature by around 40% and 22% respectively. With the microwave power increasing, the axial uniformity of both electron density and electron excitation temperature performs better. Nevertheless, the fluctuation of electron density along the axial direction appeared with higher gas pressure. The axial uniformity of coaxial surface wave linear plasma could be controlled by pressure and power for a better utilization in material processing.

scholarly journals Optical Emission Spectroscopy of Magnethron Discharge Ar/Cu Plasma

2019 ◽  
Vol 6 (1) ◽  
pp. 87-90
Author(s):  
A. Murmantsev ◽  
A. Veklich ◽  
V. Boretskij ◽  
A. Shapovalov ◽  
A. Kalenyuk
Keyword(s):  
Electron Density ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Argon Plasma ◽  
Optical Emission ◽  
Excitation Temperature ◽  
Plasma Parameters ◽  
Magnetron Discharge ◽  
Deposition Processes ◽  
Switching Devices

Plasma parameters (excitation temperature and electron density) of pulsing magnetron discharge is studied by optical emission spectroscopy. Such discharges are usually used as effective sources in sputtering or deposition processes. Vapor admixtures in argon plasma define mainly the temperature and electron density in such discharges. This is the feature, which is typically takes place in plasma of discharge between contacts/electrodes in switching devices of electric technology circuits.

Use of Optical Emission Spectroscopy as a Diagnostic Technique for Plasma Deposition of Hydrogenated Amorphous Silicon and Carbon

1983 ◽  
Vol 30 ◽  
Author(s):  
F. J. Kampas
Keyword(s):  
Energy Distribution ◽  
Amorphous Silicon ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Plasma Deposition ◽  
Hydrogenated Amorphous Silicon ◽  
Diagnostic Technique ◽  
Optical Emission ◽  
Hydrogen Mixtures ◽  
Hydrogenated Amorphous

ABSTRACTOptical emission intensities have been measured as a function of composition for silane-argon and silane-hydrogen mixtures used in the deposition of hydrogenated amorphous silicon. It was found that changes in silane fraction have a large effect on the electron concentration and energy distribution in the discharge.

scholarly journals EXCITATION TEMPERATURES IN PLASMA OF UNDERWATER DISHARGES BETWEEN IRON GRANULES

2020 ◽  
pp. 204-207
Author(s):  
A. Murmantsev ◽  
A. Veklich ◽  
V. Boretskij
Keyword(s):  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Discharge Plasma ◽  
Optical Emission ◽  
Spectral Lines ◽  
Plasma Emission ◽  
Excitation Temperature ◽  
Underwater Discharge ◽  
Selection Of

This paper deals with development of optical emission spectroscopy techniques for diagnostic of underwater discharge plasma between iron granules. The difficulties in selection of iron spectral lines, as well as the approximation of their profiles for determination of excitation temperature are discussed. A method of spectral lines resolving with close wavelengths is considered. Simulation of a narrow rangeof the plasma emission spectrum is carried out to estimate the excitation temperatures in underwater discharge plasma.

scholarly journals Spectroscopic Investigation of Laser-Induced Graphene Plasma

2021 ◽  
Vol 22 (1) ◽  
Author(s):  
Madyan Khalaf
Keyword(s):  
Electron Temperature ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
Plasma Electron ◽  
Emission Lines ◽  
Spectroscopy Technique ◽  
Fundamental Wavelength ◽  
Upper Limit ◽  
Fundamental Radiation

In this paper, graphene plasma was obtained through the interaction of the fundamental radiation from a pulsed Nd:YAG laser at the fundamental wavelength of 1064 nm focused onto a solid plane of graphene material. This reaction was carried out under conditions of an atmospheric status. The resulting plasma was tested using an optical emission spectroscopy technique. The temperature of the electrons is calculated by the tow line ratio of C I and C II emission lines singly ionised, and the density of the plasma electron is calculated with Saha-Boltzmann equation. The upper limit of the electron temperature was approximately 1.544 eV. The corresponding electron density was 11.5×1015 cm-3. Then the electron temperature decreased when the energy was 300 mJ and it was near 1.462 eV, corresponding to the density of those electrons 8.7×1015 cm-3.

Sign in / Sign up

Export Citation Format

Share Document