scholarly journals Optical Emission Spectroscopy of Magnethron Discharge Ar/Cu Plasma

2019 ◽  
Vol 6 (1) ◽  
pp. 87-90
Author(s):  
A. Murmantsev ◽  
A. Veklich ◽  
V. Boretskij ◽  
A. Shapovalov ◽  
A. Kalenyuk

Plasma parameters (excitation temperature and electron density) of pulsing magnetron discharge is studied by optical emission spectroscopy. Such discharges are usually used as effective sources in sputtering or deposition processes. Vapor admixtures in argon plasma define mainly the temperature and electron density in such discharges. This is the feature, which is typically takes place in plasma of discharge between contacts/electrodes in switching devices of electric technology circuits.

Coatings ◽  
2021 ◽  
Vol 11 (10) ◽  
pp. 1221
Author(s):  
Jun-Hyoung Park ◽  
Ji-Ho Cho ◽  
Jung-Sik Yoon ◽  
Jung-Ho Song

We present a non-invasive approach for monitoring plasma parameters such as the electron temperature and density inside a radio-frequency (RF) plasma nitridation device using optical emission spectroscopy (OES) in conjunction with multivariate data analysis. Instead of relying on a theoretical model of the plasma emission to extract plasma parameters from the OES, an empirical correlation was established on the basis of simultaneous OES and other diagnostics. Additionally, we developed a machine learning (ML)-based virtual metrology model for real-time Te and ne monitoring in plasma nitridation processes using an in situ OES sensor. The results showed that the prediction accuracy of electron density was 97% and that of electron temperature was 90%. This method is especially useful in plasma processing because it provides in-situ and real-time analysis without disturbing the plasma or interfering with the process.


2013 ◽  
Vol 770 ◽  
pp. 245-248 ◽  
Author(s):  
Kanchaya Honglertkongsakul

Argon plasma jet in a single-electrode configuration was generated at low temperature and atmospheric pressure by 50 kHz radiofrequency power supply. Optical Emission Spectroscopy (OES) was used to investigate the local emissivity of argon plasma in the range between 200 and 1,100 nm. The spatial distribution of reactive species was measured at different distances of the plasma expansion from the nozzle exit such as 0.0, 0.5, 1.0, 1.5, 2.0, 2.5 and 3.0 cm. These measurements were obtained to analyze the plasma parameters such as electron temperature and electron density. The effect of distances of the plasma expansion from the nozzle exit on the plasma parameters was studied. The main intensive argon lines were found in the region between 690 and 970 nm. The electron temperature was found in the range of 0.5-1.1 eV. The electron density was found in the range of 4.0x1012-1.2x1013 cm-3. The plasma parameters strongly depended on the distances of the plasma expansion from the nozzle exit.


Author(s):  
Wenjin Zhang ◽  
Xinyu Wei ◽  
Longwei Chen ◽  
Qifu Lin ◽  
Yiman Jiang ◽  
...  

Abstract The coaxial surface wave linear plasma with preeminent axial uniformity is developed with the 2.45 GHz microwave generator. By optical emission spectroscopy, parameters of the argon linear plasma with a length over 600 mm are diagnosed under gas pressure of 30 Pa and 50 Pa and different microwave powers. The spectral lines of argon and Hβ (486.1 nm) atoms in excited state are observed for estimating electron excitation temperature and electron density. Spectrum bands in 305–310 nm of diatomic OH (A2 Σ+-X2 Πi) radicals are used to determine the molecule rotational temperature. Finally, the axial uniformity of electron density and electron excitation temperature are analyzed emphatically under various conditions. The results prove the distinct optimization of compensation from dual powers input, which can narrow the uniform coefficient of electron density and electron excitation temperature by around 40% and 22% respectively. With the microwave power increasing, the axial uniformity of both electron density and electron excitation temperature performs better. Nevertheless, the fluctuation of electron density along the axial direction appeared with higher gas pressure. The axial uniformity of coaxial surface wave linear plasma could be controlled by pressure and power for a better utilization in material processing.


2018 ◽  
Vol 15 (35) ◽  
pp. 142-147
Author(s):  
Hammad R. Humud

This work aims to study the exploding copper wire plasma parameters by optical emission spectroscopy. The emission spectra of the copper plasma have been recorded and analyzed The plasma electron temperature (Te), was calculated by Boltzmann plot, and the electron density (ne) calculated by using Stark broadening method for different copper wire diameter (0.18, 0.24 and 0.3 mm) and currentof 75A in distilled water. The hydrogen (Hα line) 656.279 nm was used to calculate the electron density for different wire diameters by Stark broadening. It was found that the electron density ne decrease from 22.4×1016 cm-3 to 17×1016 cm-3 with increasing wire diameter from 0.18 mm to 0.3 mm while the electron temperatures increase from 0.741 to 0.897 eV for the same wire diameters. The optical emission spectrum (OES) emitted from the plasma have Hα line, small peak at 590 nm corresponding to sodium and others peaks belong to Cu I. The relationship between the plasma electron temperature, emission line intensity and number density with the formed copper nanoparticles size and concentration were studied. It was found that the nanoparticles concentration increase with emission line intensity while its size decrease. It can be conclude the existence of a controlled relationship between the plasma parameters and the formed nanoparticles concentration and size.


2010 ◽  
Vol 107 (5) ◽  
pp. 053305 ◽  
Author(s):  
Sergey G. Belostotskiy ◽  
Tola Ouk ◽  
Vincent M. Donnelly ◽  
Demetre J. Economou ◽  
Nader Sadeghi

Sign in / Sign up

Export Citation Format

Share Document