FABRICATION OF SmBiO3/NiO DOUBLE BUFFER LAYER FOR COATED CONDUCTORS
2013 ◽
Vol 27
(15)
◽
pp. 1362018
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Keyword(s):
NiO layers were prepared in Ar flow at temperatures between 750°C to 850°C by using surface oxidation epitaxial method on Ni –5%W alloy substrates. NiO (200) buffer layer with well textured, smooth, dense and crack-free surface was prepared in Ar ambience with a flow rate of 500 ml/min at 800°C for 10.0 min. Then SmBiO 3 buffer layer was coated on the well epitaxial NiO (200) layer by chemical solution deposition (CSD) method.
2007 ◽
Vol 452
(1-2)
◽
pp. 43-47
◽
2008 ◽
Vol 466
(1-2)
◽
pp. 429-434
◽
2020 ◽
Vol 31
(7)
◽
pp. 5617-5621
◽
2015 ◽
Vol 29
(25n26)
◽
pp. 1542040
2013 ◽
Vol 26
(7)
◽
pp. 075016
◽
2006 ◽
Vol 21
(3)
◽
pp. 767-773
◽
2007 ◽
Vol 17
(4)
◽
pp. 3880-3885
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Keyword(s):