INTERPRETATION OF REFLECTION HIGH ENERGY ELECTRON DIFFRACTION FROM DISORDERED SURFACES: DYNAMICAL THEORY AND ITS APPLICATION TO THE EXPERIMENT

1999 ◽  
Vol 06 (03n04) ◽  
pp. 461-495 ◽  
Author(s):  
UWE KORTE

Reflection high energy electron diffraction (RHEED) is one of the few surface science techniques that are applied in a fabrication process, namely to monitor the epitaxial growth of ultrathin films and advanced materials. In spite of this technological relevance the multiple scattering nature of the involved scattering processes has hindered the quantitative interpretation of RHEED in the case of real, i.e. imperfect, surfaces for a long time. This article reviews recent progress in the understanding of RHEED from surfaces exhibiting various types of disorder. It concentrates on a multiple scattering formalism — based on perturbation theory with the nonperiodic part of the structure as perturbation — that allows the computation and interpretation of RHEED from real systems. The validity regime of the approach is discussed. We demonstrate the potential of the method by its application to the quantitative interpretation of experimental data. The range of treated problems comprises occupational disorder, intensity oscillations, structure of disordered metal/adsorbate systems, diffuse scattering from adatoms, Kikuchi scattering and phonon scattering.

1988 ◽  
Vol 128 (8) ◽  
pp. 447-450 ◽  
Author(s):  
S.Y. Tong ◽  
T.C. Zhao ◽  
H.C. Poon ◽  
K.D. Jamison ◽  
D.N. Zhou ◽  
...  

1994 ◽  
Vol 01 (02n03) ◽  
pp. 261-271 ◽  
Author(s):  
T.C. ZHAO ◽  
S.Y. TONG ◽  
A. IGNATIEV

Using the R-matrix dynamical theory of Reflection High-Energy Electron Diffraction (RHEED), we analyze the intensity anomalies commonly observed in RHEED rocking curves. Results for Ag(001) and Pt(111) show that the anomalies are associated with the trapping of particular components of the electron wave field inside the crystal by linear chain potential parallel to the surface. These pseudobound states correspond to minima in the total elastic flux of an ultrathin film (≤10 monolayer) and maxima in the inelastic flux. The discrete energy levels of the bound states in Ag(001) and Pt(111) are determined for the first time and the effect of such bound states on the rocking curves is discussed.


Author(s):  
L. -M. Peng ◽  
M. J. Whelan

In recent years there has been a trend in the structure determination of reconstructed surfaces to use high energy electron diffraction techniques, and to employ a kinematic approximation in analyzing the intensities of surface superlattice reflections. Experimentally this is motivated by the great success of the determination of the dimer adatom stacking fault (DAS) structure of the Si(111) 7 × 7 reconstructed surface.While in the case of transmission electron diffraction (TED) the validity of the kinematic approximation has been examined by using multislice calculations for Si and certain incident beam directions, far less has been done in the reflection high energy electron diffraction (RHEED) case. In this paper we aim to provide a thorough Bloch wave analysis of the various diffraction processes involved, and to set criteria on the validity for the kinematic analysis of the intensities of the surface superlattice reflections.The validity of the kinematic analysis, being common to both the TED and RHEED case, relies primarily on two underlying observations, namely (l)the surface superlattice scattering in the selvedge is kinematically dominating, and (2)the superlattice diffracted beams are uncoupled from the fundamental diffracted beams within the bulk.


Author(s):  
Michael T. Marshall ◽  
Xianghong Tong ◽  
J. Murray Gibson

We have modified a JEOL 2000EX Transmission Electron Microscope (TEM) to allow in-situ ultra-high vacuum (UHV) surface science experiments as well as transmission electron diffraction and imaging. Our goal is to support research in the areas of in-situ film growth, oxidation, and etching on semiconducter surfaces and, hence, gain fundamental insight of the structural components involved with these processes. The large volume chamber needed for such experiments limits the resolution to about 30 Å, primarily due to electron optics. Figure 1 shows the standard JEOL 2000EX TEM. The UHV chamber in figure 2 replaces the specimen area of the TEM, as shown in figure 3. The chamber is outfitted with Low Energy Electron Diffraction (LEED), Auger Electron Spectroscopy (AES), Residual Gas Analyzer (RGA), gas dosing, and evaporation sources. Reflection Electron Microscopy (REM) is also possible. This instrument is referred to as SHEBA (Surface High-energy Electron Beam Apparatus).The UHV chamber measures 800 mm in diameter and 400 mm in height. JEOL provided adapter flanges for the column.


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