Guiding Principle in the Preparation of High-Photosensitive Hydrogenated Amorphous Si-Ge Alloys from Glow-Discharge Plasma

1986 ◽  
Vol 25 (Part 2, No. 1) ◽  
pp. L54-L56 ◽  
Author(s):  
Akihisa Matsuda ◽  
Masato Koyama ◽  
Nozomu Ikuchi ◽  
Yuichiro Imanishi ◽  
Kazunobu Tanaka
1986 ◽  
Vol 60 (11) ◽  
pp. 4025-4027 ◽  
Author(s):  
A. Matsuda ◽  
T. Yamaoka ◽  
S. Wolff ◽  
M. Koyama ◽  
Y. Imanishi ◽  
...  

2002 ◽  
Vol 16 (06n07) ◽  
pp. 860-865 ◽  
Author(s):  
MANJU MALHOTRA ◽  
SATYENDRA KUMAR

We report on the growth of hydrogenated amorphous carbon (a-C:H) films, using a simple dc glow discharge plasma chemical vapor deposition method. A variety of complementary techniques were employed to analyze the properties of these films. a-C:H films having high fraction of tetrahedrally ( sp 3) bonded carbon atoms (~ 70%) and low hydrogen content (< 5at.%) were obtained. These films were characterized by a high optical bandgap ~ 2.7 eV, and refractive index (at 600nm) ~ 2.2. Growth of metastable diamond structure in a-C:H is attributed to energetic condensation of carbon containing ions in ( sp 3) configuration.


2020 ◽  
Vol 1686 ◽  
pp. 012013
Author(s):  
V.N. Arustamov ◽  
R.KH. Ashurov ◽  
V.M. Rotchtein ◽  
KH.B. Ashurov ◽  
I.KH. Khudaykulov

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