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Low Temperature Silicon Surface Cleaning by HF Etching/Ultraviolet Ozone Cleaning (HF/UVOC) Method (II)–in situUVOC
Japanese Journal of Applied Physics
◽
10.1143/jjap.28.2425
◽
1989
◽
Vol 28
(Part 1, No. 12)
◽
pp. 2425-2429
◽
Cited By ~ 20
Author(s):
Tetsuya Kaneko
◽
Maki Suemitsu
◽
Nobuo Miyamoto
Keyword(s):
Low Temperature
◽
Silicon Surface
◽
Surface Cleaning
Download Full-text
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Silicon Surface Cleaning for Low Temperature Epitaxial Growth
MRS Proceedings
◽
10.1557/proc-315-71
◽
1993
◽
Vol 315
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Author(s):
John O. Borland
◽
Carol Riggi
◽
Faye Brocious
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Low Temperature
◽
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◽
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◽
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Chlorine for in-situ Low-Temperature Silicon Surface Cleaning for Epitaxy Applications
ECS Meeting Abstracts
◽
10.1149/ma2007-01/12/603
◽
2007
◽
Keyword(s):
Low Temperature
◽
Silicon Surface
◽
Surface Cleaning
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Silicon surface cleaning by low dose argon‐ion bombardment for low‐temperature (750 °C) epitaxial silicon deposition. I. Process considerations
Journal of Applied Physics
◽
10.1063/1.339301
◽
1987
◽
Vol 62
(8)
◽
pp. 3388-3397
◽
Cited By ~ 83
Author(s):
James H. Comfort
◽
Linda M. Garverick
◽
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Keyword(s):
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◽
Silicon Surface
◽
Low Dose
◽
Ion Bombardment
◽
Surface Cleaning
◽
Epitaxial Silicon
◽
Silicon Deposition
◽
Argon Ion Bombardment
◽
Argon Ion
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Silicon surface cleaning by low dose argon‐ion bombardment for low‐temperature (750 °C) epitaxial deposition. II. Epitaxial quality
Journal of Applied Physics
◽
10.1063/1.339302
◽
1987
◽
Vol 62
(8)
◽
pp. 3398-3404
◽
Cited By ~ 45
Author(s):
L. M. Garverick
◽
J. H. Comfort
◽
T. R. Yew
◽
R. Reif
◽
F. A. Baiocchi
◽
...
Keyword(s):
Low Temperature
◽
Silicon Surface
◽
Low Dose
◽
Ion Bombardment
◽
Surface Cleaning
◽
Epitaxial Deposition
◽
Argon Ion Bombardment
◽
Argon Ion
Download Full-text
Silicon surface cleaning by low dose argon-ion bombardment for low-temperature (750°C) epitaxial silicon deposition. I. Process considerations
Vacuum
◽
10.1016/0042-207x(89)90476-4
◽
1989
◽
Vol 39
(5)
◽
pp. 513
Keyword(s):
Low Temperature
◽
Silicon Surface
◽
Low Dose
◽
Ion Bombardment
◽
Surface Cleaning
◽
Epitaxial Silicon
◽
Silicon Deposition
◽
Argon Ion Bombardment
◽
Argon Ion
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Chlorine Etching for In-Situ Low-Temperature Silicon Surface Cleaning for Epitaxy Applications
ECS Transactions
◽
10.1149/1.2727426
◽
2019
◽
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◽
pp. 401-407
◽
Cited By ~ 4
Author(s):
Keith H. Chung
◽
James C. Sturm
Keyword(s):
Low Temperature
◽
Silicon Surface
◽
Surface Cleaning
Download Full-text
Low Temperature Silicon Surface Cleaning by HF Etching/Ultraviolet Ozone Cleaning (HF/UVOC) Method (I) –Optimization of the HF Treatment–
Japanese Journal of Applied Physics
◽
10.1143/jjap.28.2421
◽
1989
◽
Vol 28
(Part 1, No. 12)
◽
pp. 2421-2424
◽
Cited By ~ 18
Author(s):
Maki Suemitsu
◽
Tetsuya Kaneko
◽
Nobuo Miyamoto
Keyword(s):
Low Temperature
◽
Silicon Surface
◽
Surface Cleaning
Download Full-text
Silicon Surface Cleaning for Low Temperature Silicon Epitaxial Growth
Solid State Phenomena
◽
10.4028/www.scientific.net/ssp.65-66.229
◽
1998
◽
Vol 65-66
◽
pp. 229-232
◽
Cited By ~ 3
Author(s):
Masao Mayuzumi
◽
M. Imai
◽
S. Nakahara
◽
Katsuya Inoue
◽
J. Takahashi
◽
...
Keyword(s):
Low Temperature
◽
Epitaxial Growth
◽
Silicon Surface
◽
Surface Cleaning
Download Full-text
Ellipsometric study of low-temperature silicon surface cleaning during the process of reactive ionized cluster beam deposition
Thin Solid Films
◽
10.1016/0040-6090(89)90693-7
◽
1989
◽
Vol 168
(1)
◽
pp. 103-111
◽
Cited By ~ 2
Author(s):
M. Koshinaka
◽
H. Fujii
◽
K. Nakanishi
◽
Y. Shibuya
Keyword(s):
Low Temperature
◽
Silicon Surface
◽
Surface Cleaning
◽
Cluster Beam
◽
Ellipsometric Study
◽
Cluster Beam Deposition
◽
Beam Deposition
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Silicon surface cleaning by low dose argon-ion bombardment for low-temperature (750°C) epitaxial deposition. II. Epitaxial quality
Vacuum
◽
10.1016/0042-207x(89)90475-2
◽
1989
◽
Vol 39
(5)
◽
pp. 513
Keyword(s):
Low Temperature
◽
Silicon Surface
◽
Low Dose
◽
Ion Bombardment
◽
Surface Cleaning
◽
Epitaxial Deposition
◽
Argon Ion Bombardment
◽
Argon Ion
Download Full-text
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