Auger Electron Spectroscopy Study on the Stability and the Interfacial Reaction of Ta, Ta-N and TaN Films as a Diffusion Barrier between Cu9Al4Film and Si
1993 ◽
Vol 32
(Part 1, No. 2)
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pp. 911-915
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1991 ◽
Vol 30
(Part 2, No. 4A)
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pp. L632-L635
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1991 ◽
Vol 30
(Part 2, No. 6B)
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pp. L1148-L1148
Keyword(s):
1989 ◽
Vol 23
(11)
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pp. 1969-1973
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Keyword(s):
1982 ◽
Vol 129
(2)
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pp. 406-408
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1997 ◽
Vol 25
(5)
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pp. 352-355
2006 ◽
Vol 83
(1)
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pp. 12-16
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Keyword(s):
Keyword(s):