Mass Spectrometry, Optical Emission Spectroscopy, and Atomic Force Microscopy Studies of Si Etch Characteristics in aCl2Plasma Generated by an Electron Cyclotron Resonance Source
1994 ◽
Vol 33
(Part 1, No. 12B)
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pp. 7112-7116
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2005 ◽
Vol 82
(1)
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pp. 35-43
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1991 ◽
Vol 11
(1)
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pp. 15-39
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1993 ◽
Vol 8
(10)
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pp. 1889-1896
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Atomic force microscopy study of III–V materials etched using an electron cyclotron resonance source
1995 ◽
Vol 13
(6)
◽
pp. 2350
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