Characteristics of Silicon Dioxide Film Prepared by Atmospheric-Pressure Chemical Vapor Deposition Using Tetraethoxysilane and Ozone with Alcohol Addition

1995 ◽  
Vol 34 (Part 1, No. 4B) ◽  
pp. 2182-2190 ◽  
Author(s):  
Koichi Ikeda ◽  
Satoshi Nakayama ◽  
Masahiko Maeda
Keyword(s):  
Chemical Vapor Deposition ◽  
Silicon Dioxide ◽  
Vapor Deposition ◽  
Atmospheric Pressure ◽  
Chemical Vapor ◽  
Silicon Dioxide Film ◽  
Pressure Chemical ◽  
Dioxide Film

Characteristics of Silicon Dioxide Film Deposited by Neutral Beam-Assisted Chemical Vapor Deposition

2008 ◽  
Vol 47 (12) ◽  
pp. 8905-8908
Author(s):  
Young Im ◽  
Jung Hee Lee ◽  
Youn-Seoung Lee ◽  
Won-Jun Lee ◽  
Sa-Kyun Rha
Keyword(s):  
Chemical Vapor Deposition ◽  
Silicon Dioxide ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Neutral Beam ◽  
Silicon Dioxide Film ◽  
Dioxide Film

Densification of chemical vapor deposition silicon dioxide film using oxygen radical oxidation

2012 ◽  
Vol 111 (3) ◽  
pp. 034101 ◽  
Author(s):  
Kazumasa Kawase ◽  
Akinobu Teramoto ◽  
Hiroshi Umeda ◽  
Tomoyuki Suwa ◽  
Yasushi Uehara ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Silicon Dioxide ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Oxygen Radical ◽  
Silicon Dioxide Film ◽  
Radical Oxidation ◽  
Dioxide Film
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