0.10 µm Dense Hole Pattern Formation by Double Exposure Utilizing Alternating Phase Shift Mask Using KrF Excimer Laser as Exposure Light
1999 ◽
Vol 38
(Part 1, No. 5A)
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pp. 2686-2693
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Keyword(s):
1997 ◽
Vol 36
(Part 1, No. 12B)
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pp. 7488-7493
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Keyword(s):
Keyword(s):
Keyword(s):