Fabrication of 0.1 µm Patterns Using an Alternating Phase Shift Mask in ArF Excimer Laser Lithography

1997 ◽  
Vol 36 (Part 1, No. 12B) ◽  
pp. 7488-7493 ◽  
Author(s):  
Keisuke Nakazawa ◽  
Masaya Uematsu ◽  
Toshio Onodera ◽  
Kazuya Kamon ◽  
Tohru Ogawa ◽  
...  
Keyword(s):  
Phase Shift ◽  
Excimer Laser ◽  
Laser Lithography ◽  
Arf Excimer Laser ◽  
Phase Shift Mask ◽  
Alternating Phase Shift Mask

Development of ZrSiO attenuated phase-shift mask for ArF excimer laser lithography

1999 ◽  
Author(s):  
Nobuhiko Fukuhara ◽  
Takashi Haraguchi ◽  
Koichiro Kanayama ◽  
Tadashi Matsuo ◽  
Susumu Takeuchi ◽  
...  
Keyword(s):  
Phase Shift ◽  
Excimer Laser ◽  
Laser Lithography ◽  
Arf Excimer Laser ◽  
Phase Shift Mask

Optimization of alternating phase-shift mask structure for ArF laser lithography

2001 ◽  
Author(s):  
Tomohiko Yamamoto ◽  
Naoyuki Ishiwata ◽  
Yuichiro Yanagishita ◽  
Takema Kobayashi ◽  
Satoru Asai
Keyword(s):  
Phase Shift ◽  
Laser Lithography ◽  
Arf Laser ◽  
Phase Shift Mask ◽  
Alternating Phase Shift Mask

0.10 µm Dense Hole Pattern Formation by Double Exposure Utilizing Alternating Phase Shift Mask Using KrF Excimer Laser as Exposure Light

1999 ◽  
Vol 38 (Part 1, No. 5A) ◽  
pp. 2686-2693 ◽  
Author(s):  
Shuji Nakao ◽  
Akihiro Nakae ◽  
Atsumi Yamaguchi ◽  
Kouichirou Tsujita ◽  
Wataru Wakamiya
Keyword(s):  
Pattern Formation ◽  
Phase Shift ◽  
Excimer Laser ◽  
Double Exposure ◽  
Krf Excimer Laser ◽  
Phase Shift Mask ◽  
Alternating Phase Shift Mask

Preliminary study of 65 nm node alternating phase-shift mask fabrication

2002 ◽  
Author(s):  
Kouji Hosono ◽  
Naoyuki Ishiwata ◽  
Satoru Asai ◽  
Hiroshi Maruyama ◽  
Yutaka Miyahara ◽  
...  
Keyword(s):  
Phase Shift ◽  
Preliminary Study ◽  
Phase Shift Mask ◽  
Alternating Phase Shift Mask ◽  
Mask Fabrication

Application of alternating phase shift mask to device fabrication

1995 ◽  
Author(s):  
Sunggi Kim ◽  
Sang-Gyun Woo ◽  
Woo-Sung Han ◽  
Young-Bum Koh ◽  
Moon-Yong Lee
Keyword(s):  
Phase Shift ◽  
Device Fabrication ◽  
Phase Shift Mask ◽  
Alternating Phase Shift Mask

scholarly journals Resists Using the Absorption Band Shift Method for ArF Excimer Laser Lithography.

1998 ◽  
Vol 11 (3) ◽  
pp. 489-492
Author(s):  
Takeshi Okino ◽  
Koji Asakawa ◽  
Naomi Shida ◽  
Tohru Ushirogouchi
Keyword(s):  
Absorption Band ◽  
Excimer Laser ◽  
Band Shift ◽  
Shift Method ◽  
Laser Lithography ◽  
Arf Excimer Laser

Introduction of full-level alternating phase-shift mask technology into IC manufacturing

2002 ◽  
Author(s):  
Joerg Thiele ◽  
Marco Ahrens ◽  
Wolfgang Dettmann ◽  
M. Heissmeier ◽  
Mario Hennig ◽  
...  
Keyword(s):  
Phase Shift ◽  
Ic Manufacturing ◽  
Phase Shift Mask ◽  
Alternating Phase Shift Mask
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