Characterization of Sputtered TiNi Shape Memory Alloy Thin Films

1999 ◽  
Vol 38 (Part 2, No. 12B) ◽  
pp. L1547-L1549 ◽  
Author(s):  
Patrick Surbled ◽  
Catherine Clerc ◽  
Bruno Le Pioufle ◽  
Hiroyuki Fujita
Keyword(s):  
Thin Films ◽  
Shape Memory Alloy ◽  
Shape Memory

Synthesis and characterization of Cu–Al–Ni shape memory alloy multilayer thin films

2013 ◽  
Vol 544 ◽  
pp. 588-592 ◽  
Author(s):  
J.F. Gómez-Cortés ◽  
J. San Juan ◽  
G.A. López ◽  
M.L. Nó
Keyword(s):  
Thin Films ◽  
Shape Memory Alloy ◽  
Shape Memory ◽  
Synthesis And Characterization ◽  
Multilayer Thin Films

Characterization of TiNi shape-memory alloy thin films for MEMS applications

2001 ◽  
Vol 145 (1-3) ◽  
pp. 107-112 ◽  
Author(s):  
Yongqing Fu ◽  
Weimin Huang ◽  
Hejun Du ◽  
Xu Huang ◽  
Junping Tan ◽  
...  
Keyword(s):  
Thin Films ◽  
Shape Memory Alloy ◽  
Shape Memory

Characterization of shape-memory alloy thin films made up from sputter-deposited Ni/Ti multilayers

2000 ◽  
Vol 48 (16) ◽  
pp. 4065-4071 ◽  
Author(s):  
T Lehnert ◽  
H Grimmer ◽  
P Böni ◽  
M Horisberger ◽  
R Gotthardt
Keyword(s):  
Thin Films ◽  
Shape Memory Alloy ◽  
Shape Memory ◽  
Sputter Deposited

High-throughput characterization of shape memory thin films using automated temperature-dependent resistance measurements

2005 ◽  
Vol 894 ◽  
Author(s):  
Sigurd Thienhaus ◽  
Christiane Zamponi ◽  
Holger Rumpf ◽  
Jae Hattrick-Simpers ◽  
Ichiro Takeuchi ◽  
...  
Keyword(s):  
Thin Films ◽  
Shape Memory Alloy ◽  
Shape Memory ◽  
High Throughput ◽  
Thermal Hysteresis ◽  
Wafer Level ◽  
Magnetic Shape Memory ◽  
Temperature Dependent ◽  
Characterization Of Materials

AbstractShape memory alloy (SMA) thin films are used as actuator materials in MEMS due to their unique properties. Binary thin films with a composition close to Ni50Ti50 are well-established materials, whereas ternaries like NiTiCu, NiTiPd, NiTiHf are less studied. Furthermore, new alloys are being developed which show a magnetic shape memory effect, e.g. Ni2MnGa. For the optimization of known, and the development of new, SMA thin films, a fast and reliable characterization technology is needed, which rapidly identifies the transformation temperatures (i.e. martensite and austenite start and finish temperatures) for a range of material compositions deposited on a whole wafer. In this paper, automated temperature-dependent resistance measurements are discussed as a means which yields the thermal hysteresis of the investigated thin films. Results of monitoring the uniformity of shape memory film depositions on the wafer level, as well as results on the use of this method as a tool for screening for new SMA films by characterization of materials libraries are reported.

Deposition and characterization of Ti–Ni–Pd and Ti–Ni–Pt shape memory alloy thin films

2005 ◽  
Vol 14 (5) ◽  
pp. S312-S316 ◽  
Author(s):  
K P Mohanchandra ◽  
Daniel Shin ◽  
G P Carman
Keyword(s):  
Thin Films ◽  
Shape Memory Alloy ◽  
Shape Memory
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