DC and RF Performance of 50 nm Gate Pseudomorphic In0.7Ga0.3As/In0.52Al0.48As High Electron Mobility Transistors Grown on (411)A-Oriented InP Substrates by Molecular-Beam Epitaxy
2000 ◽
Vol 39
(Part 2, No. 7B)
◽
pp. L720-L722
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2002 ◽
Vol 49
(3)
◽
pp. 354-360
◽
2000 ◽
Vol 47
(5)
◽
pp. 1115-1117
◽
2011 ◽
Vol 29
(3)
◽
pp. 03C107
◽
2006 ◽
Vol E89-C
(7)
◽
pp. 906-912
◽
2005 ◽