DC and RF Performance of 50 nm Gate Pseudomorphic In0.7Ga0.3As/In0.52Al0.48As High Electron Mobility Transistors Grown on (411)A-Oriented InP Substrates by Molecular-Beam Epitaxy

2000 ◽  
Vol 39 (Part 2, No. 7B) ◽  
pp. L720-L722 ◽  
Author(s):  
Masataka Higashiwaki ◽  
Takahiro Kitada ◽  
Toyohiro Aoki ◽  
Satoshi Shimomura ◽  
Yoshimi Yamashita ◽  
...  
2012 ◽  
Vol 5 (9) ◽  
pp. 091003 ◽  
Author(s):  
Nethaji Dharmarasu ◽  
K. Radhakrishnan ◽  
Manvi Agrawal ◽  
Lingaparthi Ravikiran ◽  
Subramaniam Arulkumaran ◽  
...  

Sign in / Sign up

Export Citation Format

Share Document