Influence of Thermal Annealing on Microstructures of Zinc Oxide Films Deposited by RF Magnetron Sputtering

2007 ◽  
Vol 46 (6A) ◽  
pp. 3319-3323 ◽  
Author(s):  
Takahiro Hiramatsu ◽  
Mamoru Furuta ◽  
Hiroshi Furuta ◽  
Tokiyoshi Matsuda ◽  
Takashi Hirao
Keyword(s):  
Zinc Oxide ◽  
Magnetron Sputtering ◽  
Thermal Annealing ◽  
Oxide Films ◽  
Rf Magnetron Sputtering ◽  
Zinc Oxide Films

Structural studies of zinc oxide films grown by RF magnetron sputtering

2005 ◽  
Vol 148 (1) ◽  
pp. 37-41 ◽  
Author(s):  
I. Sayago ◽  
M. Aleixandre ◽  
A. Martínez ◽  
M.J. Fernández ◽  
J.P. Santos ◽  
...  
Keyword(s):  
Zinc Oxide ◽  
Magnetron Sputtering ◽  
Oxide Films ◽  
Rf Magnetron Sputtering ◽  
Structural Studies ◽  
Zinc Oxide Films

Tailoring the properties of zinc oxide films by incorporating gold nanoparticles using RF magnetron sputtering

2018 ◽  
Vol 124 (12) ◽  
Author(s):  
R. Sreeja Sreedharan ◽  
V. S. Kavitha ◽  
S. Suresh ◽  
R. Reshmi Krishnan ◽  
R. Jolly Bose ◽  
...  
Keyword(s):  
Gold Nanoparticles ◽  
Zinc Oxide ◽  
Magnetron Sputtering ◽  
Oxide Films ◽  
Rf Magnetron Sputtering ◽  
Zinc Oxide Films

scholarly journals RF Power and Thermal Annealing Effect on the Properties of Zinc Oxide Films Prepared by Radio Frequency Magnetron Sputtering

2007 ◽  
Vol 2007 ◽  
pp. 1-5 ◽  
Author(s):  
Chaoyang Li ◽  
Mamoru Furuta ◽  
Tokiyoshi Matsuda ◽  
Takahiro Hiramatsu ◽  
Hiroshi Furuta ◽  
...  
Keyword(s):  
Zinc Oxide ◽  
Magnetron Sputtering ◽  
Radio Frequency ◽  
Thermal Annealing ◽  
Annealing Temperature ◽  
Rf Magnetron Sputtering ◽  
Zno Films ◽  
Zinc Oxide Films ◽  
Deposition Power ◽  
Comparison Measurements

Polycrystalline zinc oxide (ZnO) films were prepared by radio frequency (RF) magnetron sputtering under different powers. The XRD results showed that ZnO crystallite size along c-axis decreased by 43% with deposition power increased from 60 W to 300 W, increased 36% with annealing temperature rising to400∘C. TDS measurement revealed that the desorption peaks of both atomic Zn (60 W-deposited) and oxygen molecule (180 W and 300 W-deposited) obtained from ZnO films were originated from300∘C. When annealing temperature was higher than300∘C, the sheet resistance dramatically decreased, and compressive stress in the (002) plane changed to tensile stress as well. The comparison measurements of ZnO films crystallinity strongly suggested that both lower deposition power and certain thermal annealing temperature over300∘Cwould contribute to the formation of high quality ZnO films.

Effect of Energetic Particle Bombardment on Microstructure of Zinc Oxide Films Deposited by RF Magnetron Sputtering

2007 ◽  
Vol 46 (7A) ◽  
pp. 4038-4041 ◽  
Author(s):  
Mamoru Furuta ◽  
Takahiro Hiramatsu ◽  
Tokiyoshi Matsuda ◽  
Hiroshi Furuta ◽  
Takashi Hirao
Keyword(s):  
Zinc Oxide ◽  
Magnetron Sputtering ◽  
Particle Bombardment ◽  
Energetic Particle ◽  
Oxide Films ◽  
Rf Magnetron Sputtering ◽  
Zinc Oxide Films
Sign in / Sign up

Export Citation Format

Share Document