HIGH RATE DEPOSITION OF HYDROGENATED AMORPHOUS SILICON USING MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION PROCESS
1989 ◽
Vol 50
(C5)
◽
pp. C5-667-C5-672
2001 ◽
Vol 40
(Part 1, No. 12)
◽
pp. 6862-6867
◽
2007 ◽
Vol 154
(5)
◽
pp. G122
◽
2008 ◽
Vol 69
(2-3)
◽
pp. 648-652
◽
1994 ◽
Vol 33
(Part 1, No. 7B)
◽
pp. 4373-4376
◽
2000 ◽
Vol 39
(Part 1, No. 11)
◽
pp. 6404-6409
◽
2009 ◽
Vol 255
(22)
◽
pp. 9058-9061
◽
1996 ◽
Vol 11
(11)
◽
pp. 2852-2860
◽
2005 ◽
Vol 14
(3-7)
◽
pp. 975-982
◽