Growth Enhancement of Radish Sprouts Induced by Low Pressure O$_{2}$ Radio Frequency Discharge Plasma Irradiation

2012 ◽  
Vol 51 (1) ◽  
pp. 01AE01 ◽  
Author(s):  
Satoshi Kitazaki ◽  
Kazunori Koga ◽  
Masaharu Shiratani ◽  
Nobuya Hayashi
2012 ◽  
Vol 51 (1S) ◽  
pp. 01AE01 ◽  
Author(s):  
Satoshi Kitazaki ◽  
Kazunori Koga ◽  
Masaharu Shiratani ◽  
Nobuya Hayashi

1999 ◽  
Vol 75 (3) ◽  
pp. 328-330 ◽  
Author(s):  
S. A. Moshkalyov ◽  
P. G. Steen ◽  
S. Gomez ◽  
W. G. Graham

2012 ◽  
Vol 1469 ◽  
Author(s):  
Satoshi Kitazaki ◽  
Kazunori Koga ◽  
Masaharu Shiratani ◽  
Nobuya Hayashi

ABSTRACTWe compared growth enhancement of radish induced by O2, air, and Ar plasma irradiation. The average length of radish sprouts cultivated for 4 days after O2plasma irradiation is 70% longer than that of sprouts without irradiation. The O2plasma irradiation is more effective in enhancing growth than air and Ar radio frequency plasma irradiation. Cell morphology and cell size of sprouts with O2plasma irradiation is nearly the same as those without irradiation. These results suggest that plasma induced acceleration of cell proliferation brings about the rapid growth.


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