Measurement of Anomalous Hall Effect in Reentrant Spin Glass Ni(Pt)Mn Thin Film

2008 ◽  
Vol 77 (6) ◽  
pp. 064702 ◽  
Author(s):  
Katsuyoshi Komatsu ◽  
Yuuki Mizuno ◽  
Hideyuki Maki ◽  
Tetsuya Sato
2003 ◽  
Vol 72 (6) ◽  
pp. 1491-1494 ◽  
Author(s):  
Taketomo Kageyama ◽  
Natsuki Aito ◽  
Satoshi Iikubo ◽  
Masatoshi Sato

2015 ◽  
Vol 1120-1121 ◽  
pp. 424-428
Author(s):  
C.Y. Zou ◽  
Lai Sen Wang ◽  
Xiang Liu ◽  
Q.F. Zhang ◽  
Jun Bao Wang ◽  
...  

In this paper, we studied the dependence of temperature and weak localization (WL) effect on the anomalous Hall effect (AHE) in strong disordered and poorly crystallized metal Co thin film deposited by high-pressure magnetron sputtering. The temperature coefficients of resistivity is positive at high temperatures and becomes negative at low temperatures, which is the typical characteristic of weak localization effect in dirty metal regime due to the strong disorder. The saturation anomalous Hall resistivity (ρAxy) have no scaling relation between ρxy and ρxx in weak localization region with temperature below 50 K. In metal region, temperature ranged from 50 K to 300 K, the relation between ρAxy and ρxxis ρAxy=A+bρ2xx, which indicates that the AHE in this Co thin film is scattering-independence at high temperature. The results also shows that the WL effect have a significant impact on the AHE of the Co thin film at low temperature.


Nanoscale ◽  
2018 ◽  
Vol 10 (21) ◽  
pp. 10041-10049 ◽  
Author(s):  
Shanna Zhu ◽  
Dechao Meng ◽  
Genhao Liang ◽  
Gang Shi ◽  
Peng Zhao ◽  
...  

A high-quality Bi2Se3/LaCoO3 heterostructure is fabricated as a new TI/FMI system for investigating a proximity-induced ferromagnetic phase in topological insulators.


Author(s):  
Takuya Matsuda ◽  
Natsuki Kanda ◽  
Tomoya Higo ◽  
N. P. Armitage ◽  
Satoru Nakatsuji ◽  
...  

2012 ◽  
Vol 21 (10) ◽  
pp. 107201 ◽  
Author(s):  
Hong-Liang Bai ◽  
Shu-Min He ◽  
Tong-Shuai Xu ◽  
Guo-Lei Liu ◽  
Shi-Shen Yan ◽  
...  

2019 ◽  
Author(s):  
Mukesh Kumar Dasoundhi ◽  
Rudra Prasad Jena ◽  
Devendra Kumar ◽  
Archana Lakhani

2011 ◽  
Vol 8 (11-12) ◽  
pp. 3051-3054 ◽  
Author(s):  
Yanhua Zong ◽  
Koji Fujita ◽  
Hirofumi Akamatsu ◽  
Shunsuke Murai ◽  
Katsuhisa Tanaka

2019 ◽  
Vol 478 ◽  
pp. 187-191 ◽  
Author(s):  
Runrun Hao ◽  
Jian Su ◽  
Qikun Huang ◽  
Tie Zhou ◽  
Jianwang Cai ◽  
...  

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